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Title: Sub-nanograin metal based high efficiency multilayer reflective optics for high energies

Journal Article · · RSC Advances
DOI: https://doi.org/10.1039/d1ra04412e · OSTI ID:1870145
 [1]; ORCiD logo [1];  [2]; ORCiD logo [3];  [4];  [5];  [5];  [4];  [1];  [1];  [6];  [7]
  1. Raja Ramanna Centre for Advanced Technology, Indore (India); Homi Bhabha National Institute, Mumbai (India)
  2. Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Bhabha Atomic Research Centre, Mumbai (India)
  4. UGC-DAE Consortium for Scientific Research, Indore (India)
  5. Raja Ramanna Centre for Advanced Technology, Indore (India)
  6. Homi Bhabha National Institute, Mumbai (India); Bhabha Atomic Research Centre, Mumbai (India)
  7. Univ. of Siegen (Germany)
+ Show Author Affiliations

The present finding illuminates the physics of the formation of interfaces of metal based hetero-structures near layer continuous limit as an approach to develop high-efficiency W/B4C multilayer (ML) optics with ML periodicity varying d = 1.86–1.23 nm at a fixed number of layer pairs N = 400. The microstructure of metal layers is tailored near the onset of grain growth to control the surface density of grains resulting in small average sizes of grains to sub-nanometers. This generates concurrently desirable atomically sharp interfaces, high optical contrast, and desirable stress properties over a large number of periods, which have evidence through the developed ML optics. We demonstrate significantly high reflectivities of ML optics measured in the energy range 10–20 keV, except for d = 1.23 nm due to quasi-continuous layers. The reflectivities at soft gamma-rays are predicted.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1870145
Journal Information:
RSC Advances, Journal Name: RSC Advances Journal Issue: 45 Vol. 11; ISSN 2046-2069
Publisher:
Royal Society of ChemistryCopyright Statement
Country of Publication:
United States
Language:
English

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