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Title: A semi-analytical model for laser induced densification in fused silica at elevated temperatures

Journal Article · · Journal of Applied Physics
DOI: https://doi.org/10.1063/5.0060476 · OSTI ID:1844065
ORCiD logo [1];  [2];  [2];  [2];  [2];  [3];  [4]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Univ. of Rochester, NY (United States)
  2. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  3. Edmund Optics, Barrington, NJ (United States)
  4. Clerio Vision, Inc., Rochester, NY (United States)

A semi-analytical model for deterministic surface smoothing of fused silica below the evaporation temperature threshold is presented. Using this model, a method for calculating deterministic track depths for laser polishing fused silica is derived and validated with experiments. In this work, model predictions were in good agreement with experiment across varying laser preheating temperature and power. With the semi-analytical method presented here, deterministic laser smoothing can be achieved in the densification regime to close the process loop of laser polishing.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); Edmund Optics
Grant/Contract Number:
AC52-07NA27344
OSTI ID:
1844065
Report Number(s):
LLNL-JRNL-813980; 1021838
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 130; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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