A semi-analytical model for laser induced densification in fused silica at elevated temperatures
Journal Article
·
· Journal of Applied Physics
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Univ. of Rochester, NY (United States)
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Edmund Optics, Barrington, NJ (United States)
- Clerio Vision, Inc., Rochester, NY (United States)
A semi-analytical model for deterministic surface smoothing of fused silica below the evaporation temperature threshold is presented. Using this model, a method for calculating deterministic track depths for laser polishing fused silica is derived and validated with experiments. In this work, model predictions were in good agreement with experiment across varying laser preheating temperature and power. With the semi-analytical method presented here, deterministic laser smoothing can be achieved in the densification regime to close the process loop of laser polishing.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); Edmund Optics
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1844065
- Report Number(s):
- LLNL-JRNL-813980; 1021838
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 130; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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