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Title: Novel channel edge doping for hump reduction in LTPS TFTs

Journal Article · · Journal of Information Display

Not Available

Sponsoring Organization:
USDOE EM Office of Technology Innovation and Development (EM-30)
OSTI ID:
1843880
Journal Information:
Journal of Information Display, Journal Name: Journal of Information Display Journal Issue: 2 Vol. 23; ISSN 1598-0316
Publisher:
Informa UK LimitedCopyright Statement
Country of Publication:
Country unknown/Code not available
Language:
English

References (13)

Electric Field-aided Selective Activation for Indium-Gallium-Zinc-Oxide Thin Film Transistors journal October 2016
“Hump” characteristics and edge effects in polysilicon thin film transistors journal December 2008
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Hysteresis characteristics in low temperature poly‐Si thin film transistors journal January 2005
Enhancement of picture quality on ultra-low brightness by optimizing the electrical potential required for OLED charging in the AMOLED displays journal May 2021
Analysis of width edge effects in advanced isolation schemes for deep submicron CMOS technologies journal January 1996
Polysilicon TFT technology for active matrix OLED displays journal May 2001
Driving Schemes for a-Si and LTPS AMOLED Displays journal December 2005
A New Voltage Driving Scheme to Suppress Non-Idealities of Polycrystalline Thin-Film Transistors for AMOLED Displays journal December 2014
LTPS TFT Process on Polyimide Substrate for Flexible AMOLED journal August 2015
Analysis of Recoverable Residual Image Characteristics of Flexible Organic Light-Emitting Diode Displays Using Polyimide Substrates journal July 2019
Effects of Channel Width and Nitride Passivation Layer on Electrical Characteristics of Polysilicon Thin-Film Transistors journal November 2011
Analysis of the Hump Characteristics in Poly-Si Thin Film Transistor journal October 2006