Novel channel edge doping for hump reduction in LTPS TFTs
Journal Article
·
· Journal of Information Display
- School of Electrical and Electronic Engineering, Yonsei University, Seoul, Republic of Korea
Not Available
- Sponsoring Organization:
- USDOE EM Office of Technology Innovation and Development (EM-30)
- OSTI ID:
- 1843880
- Journal Information:
- Journal of Information Display, Journal Name: Journal of Information Display Journal Issue: 2 Vol. 23; ISSN 1598-0316
- Publisher:
- Informa UK LimitedCopyright Statement
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
Similar Records
Metal-organic framework derived hierarchically porous nitrogen-doped carbon nanostructures as novel electrocatalyst for oxygen reduction reaction
The double-humped fission barrier
Improving electrical performance and bias stability of HfInZnO-TFT with optimizing the channel thickness
Journal Article
·
2015
· Electrochimica Acta
·
OSTI ID:1247182
+6 more
The double-humped fission barrier
Journal Article
·
1980
· Rev. Mod. Phys.; (United States)
·
OSTI ID:7091839
Improving electrical performance and bias stability of HfInZnO-TFT with optimizing the channel thickness
Journal Article
·
2013
· AIP Advances
·
OSTI ID:22220367
+3 more