Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

Martins, H. P.; Conti, G.; Cordova, I.; Falling, L.; Kersell, H.; Salmassi, F.; Gullikson, E.; Vishik, I.; Baeumer, C.; Naulleau, P.; Schneider, C. M.; Nemsak, S.

doi:10.1088/1361-6463/ac2067

Title: Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

Abstract

Near total reflection regime has been widely used in x-ray science, specifically in grazing incidence small angle x-ray scattering and in hard x-ray photoelectron spectroscopy (XPS). In this work, we introduce some practical aspects of using near total reflection (NTR) in ambient pressure XPS and apply this technique to study chemical concentration gradients in a substrate/photoresist system. Experimental data are accompanied by x-ray optical and photoemission simulations to quantitatively probe the photoresist and the interface with the depth accuracy of ~1 nm. Together, our calculations and experiments confirm that NTR XPS is a suitable method to extract information from buried interfaces with highest depth-resolution, which can help address open research questions regarding our understanding of concentration profiles, electrical gradients, and charge transfer phenomena at such interfaces. Furthermore, the presented methodology is especially attractive for solid/liquid interface studies, since it provides all the strengths of a Bragg-reflection standing-wave spectroscopy without the need of an artificial multilayer mirror serving as a standing wave generator, thus dramatically simplifying the sample synthesis.

Authors:

^[1];

^[2]; Cordova, I. ^[3];

^[3];

^[3]; Salmassi, F. ^[3]; Gullikson, E. ^[3];

^[4];

^[5]; Naulleau, P. ^[3];

^[6];

^[3]

Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Carnegie Mellon Univ., Pittsburgh, PA (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of California, Davis, CA (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Univ. of California, Davis, CA (United States)
Univ. of Twente (The Netherlands)
Univ. of California, Davis, CA (United States); Forschungszentrum Juelich (Germany)

Publication Date:: Wed Sep 08 00:00:00 EDT 2021

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of California, Davis, CA (United States)

Sponsoring Org.:: USDOE Office of Science (SC)

OSTI Identifier:: 1834590

Alternate Identifier(s):: OSTI ID: 1866267

Grant/Contract Number:: AC02-05CH11231; SC0014697

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Physics. D, Applied Physics

Additional Journal Information:: Journal Volume: 54; Journal Issue: 46; Journal ID: ISSN 0022-3727

Publisher:: IOP Publishing

Country of Publication:: United States

Language:: English

Subject:: 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; X-ray photoelectron spectroscopy; near total reflection; solid/liquid interface; solid/solid interface; photoresist

Citation Formats


                    Martins, H. P., Conti, G., Cordova, I., Falling, L., Kersell, H., Salmassi, F., Gullikson, E., Vishik, I., Baeumer, C., Naulleau, P., Schneider, C. M., and Nemsak, S. Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces.  United States: N. p., 2021. 
Web.  doi:10.1088/1361-6463/ac2067.

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                    Martins, H. P., Conti, G., Cordova, I., Falling, L., Kersell, H., Salmassi, F., Gullikson, E., Vishik, I., Baeumer, C., Naulleau, P., Schneider, C. M., & Nemsak, S. Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces.  United States.  https://doi.org/10.1088/1361-6463/ac2067

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                    Martins, H. P., Conti, G., Cordova, I., Falling, L., Kersell, H., Salmassi, F., Gullikson, E., Vishik, I., Baeumer, C., Naulleau, P., Schneider, C. M., and Nemsak, S. Wed .  
"Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces".  United States.  https://doi.org/10.1088/1361-6463/ac2067.  https://www.osti.gov/servlets/purl/1834590.

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@article{osti_1834590,

  title        = {Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces},

  author       = {Martins, H. P. and Conti, G. and Cordova, I. and Falling, L. and Kersell, H. and Salmassi, F. and Gullikson, E. and Vishik, I. and Baeumer, C. and Naulleau, P. and Schneider, C. M. and Nemsak, S.},

  abstractNote = {Near total reflection regime has been widely used in x-ray science, specifically in grazing incidence small angle x-ray scattering and in hard x-ray photoelectron spectroscopy (XPS). In this work, we introduce some practical aspects of using near total reflection (NTR) in ambient pressure XPS and apply this technique to study chemical concentration gradients in a substrate/photoresist system. Experimental data are accompanied by x-ray optical and photoemission simulations to quantitatively probe the photoresist and the interface with the depth accuracy of ~1 nm. Together, our calculations and experiments confirm that NTR XPS is a suitable method to extract information from buried interfaces with highest depth-resolution, which can help address open research questions regarding our understanding of concentration profiles, electrical gradients, and charge transfer phenomena at such interfaces. Furthermore, the presented methodology is especially attractive for solid/liquid interface studies, since it provides all the strengths of a Bragg-reflection standing-wave spectroscopy without the need of an artificial multilayer mirror serving as a standing wave generator, thus dramatically simplifying the sample synthesis.},

  doi          = {10.1088/1361-6463/ac2067},

  journal      = {Journal of Physics. D, Applied Physics},

  number       = 46,

  volume       = 54,

  place        = {United States},

  year         = {Wed Sep 08 00:00:00 EDT 2021},

  month        = {Wed Sep 08 00:00:00 EDT 2021}

}

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Works referenced in this record:

Fundamental understanding of chemical processes in extreme ultraviolet resist materials
journal, October 2018

Kostko, Oleg; Xu, Bo; Ahmed, Musahid
The Journal of Chemical Physics, Vol. 149, Issue 15
DOI: 10.1063/1.5046521

High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
journal, August 2020

Manouras, Theodore; Argitis, Panagiotis
Nanomaterials, Vol. 10, Issue 8
DOI: 10.3390/nano10081593

Investigation of solid/vapor interfaces using ambient pressure X-ray photoelectron spectroscopy
journal, January 2013

Starr, D. E.; Liu, Z.; Hävecker, M.
Chemical Society Reviews, Vol. 42, Issue 13
DOI: 10.1039/c3cs60057b

Atomic subshell photoionization cross sections and asymmetry parameters: 1 ⩽ Z ⩽ 103
journal, January 1985

Yeh, J. J.; Lindau, I.
Atomic Data and Nuclear Data Tables, Vol. 32, Issue 1
DOI: 10.1016/0092-640X(85)90016-6

Perspective—Outlook on Operando Photoelectron and Absorption Spectroscopy to Probe Catalysts at the Solid-Liquid Electrochemical Interface
journal, January 2020

Carbonio, Emilia A.; Velasco-Velez, Juan-Jesus; Schlögl, Robert
Journal of The Electrochemical Society, Vol. 167, Issue 5
DOI: 10.1149/1945-7111/ab68d2

X-ray diffraction from Si/Ge layers: Diffuse scattering in the region of total external reflection
journal, January 1995

Schlomka, J. -P.; Tolan, M.; Schwalowsky, L.
Physical Review B, Vol. 51, Issue 4
DOI: 10.1103/PhysRevB.51.2311

Present and new frontiers in materials research by ambient pressure x-ray photoelectron spectroscopy
journal, July 2020

Schnadt, Joachim; Knudsen, Jan; Johansson, Niclas
Journal of Physics: Condensed Matter, Vol. 32, Issue 41
DOI: 10.1088/1361-648X/ab9565

Surface Studies of Solids by Total Reflection of X-Rays
journal, July 1954

Parratt, L. G.
Physical Review, Vol. 95, Issue 2
DOI: 10.1103/PhysRev.95.359

Operando characterization of interfacial charge transfer processes
journal, May 2021

Baeumer, Christoph
Journal of Applied Physics, Vol. 129, Issue 17
DOI: 10.1063/5.0046142

Aqueous solution/metal interfaces investigated in operando by photoelectron spectroscopy
journal, January 2015

Karslıoğlu, O.; Nemšák, S.; Zegkinoglou, I.
Faraday Discussions, Vol. 180
DOI: 10.1039/C5FD00003C

Interface Science Using Ambient Pressure Hard X-ray Photoelectron Spectroscopy
journal, January 2019

Favaro, Marco; Abdi, Fatwa; Crumlin, Ethan
Surfaces, Vol. 2, Issue 1
DOI: 10.3390/surfaces2010008

Making use of x-ray optical effects in photoelectron-, Auger electron-, and x-ray emission spectroscopies: Total reflection, standing-wave excitation, and resonant effects
journal, February 2013

Yang, S. -H.; Gray, A. X.; Kaiser, A. M.
Journal of Applied Physics, Vol. 113, Issue 7
DOI: 10.1063/1.4790171

Concentration and chemical-state profiles at heterogeneous interfaces with sub-nm accuracy from standing-wave ambient-pressure photoemission
journal, November 2014

Nemšák, Slavomír; Shavorskiy, Andrey; Karslioglu, Osman
Nature Communications, Vol. 5, Issue 1
DOI: 10.1038/ncomms6441

Interface properties of magnetic tunnel junction ${La}_{0.7} {Sr}_{0.3} {MnO}_{3} / {SrTiO}_{3}$ superlattices studied by standing-wave excited photoemission spectroscopy
journal, November 2010

Gray, A. X.; Papp, C.; Balke, B.
Physical Review B, Vol. 82, Issue 20
DOI: 10.1103/PhysRevB.82.205116

Depth Profiling Charge Accumulation from a Ferroelectric into a Doped Mott Insulator
journal, March 2015

Marinova, Maya; Rault, Julien E.; Gloter, Alexandre
Nano Letters, Vol. 15, Issue 4
DOI: 10.1021/acs.nanolett.5b00104

An Efficient Algorithm for Automatic Structure Optimization in X-ray Standing-Wave Experiments
journal, January 2019

Karslıoğlu, Osman; Gehlmann, Mathias; Müller, Juliane
Journal of Electron Spectroscopy and Related Phenomena, Vol. 230
DOI: 10.1016/j.elspec.2018.10.006

Some future perspectives in soft- and hard- X-ray photoemission
journal, August 2014

Fadley, Charles S.; Nemšák, Slavomir
Journal of Electron Spectroscopy and Related Phenomena, Vol. 195
DOI: 10.1016/j.elspec.2014.06.004

Core level photoelectron spectroscopy of heterogeneous reactions at liquid–vapor interfaces: Current status, challenges, and prospects
journal, February 2021

Dupuy, Rémi; Richter, Clemens; Winter, Bernd
The Journal of Chemical Physics, Vol. 154, Issue 6
DOI: 10.1063/5.0036178

Calibrated binding energies of some core levels in the energy range between 1.5–4 keV
journal, January 1988

Huschka, W.; Ross, D.; Maier, M.
Journal of Electron Spectroscopy and Related Phenomena, Vol. 46, Issue 2
DOI: 10.1016/0368-2048(88)85024-2

Three-dimensional coherent X-ray surface scattering imaging near total external reflection
journal, August 2012

Sun, Tao; Jiang, Zhang; Strzalka, Joseph
Nature Photonics, Vol. 6, Issue 9
DOI: 10.1038/nphoton.2012.178

A theoritical study on spin coating technique
journal, December 2013

Tyona, M. D.
Advances in materials Research, Vol. 2, Issue 4
DOI: 10.12989/amr.2013.2.4.195

Energetic, spatial, and momentum character of the electronic structure at a buried interface: The two-dimensional electron gas between two metal oxides
journal, June 2016

Nemšák, S.; Conti, G.; Gray, A. X.
Physical Review B, Vol. 93, Issue 24
DOI: 10.1103/PhysRevB.93.245103

Waveguide-enhanced grazing-incidence small-angle x-ray scattering of buried nanostructures in thin films
journal, August 2011

Jiang, Zhang; Lee, Dong Ryeol; Narayanan, Suresh
Physical Review B, Vol. 84, Issue 7
DOI: 10.1103/PhysRevB.84.075440

X-Ray Evanescent-Wave Absorption and Emission
journal, January 1983

Becker, R. S.; Golovchenko, J. A.; Patel, J. R.
Physical Review Letters, Vol. 50, Issue 3
DOI: 10.1103/PhysRevLett.50.153

Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)
journal, July 1972

Henke, Burton L.
Physical Review A, Vol. 6, Issue 1
DOI: 10.1103/PhysRevA.6.94

Combining theory and experiment in electrocatalysis: Insights into materials design
journal, January 2017

Seh, Zhi Wei; Kibsgaard, Jakob; Dickens, Colin F.
Science, Vol. 355, Issue 6321
DOI: 10.1126/science.aad4998

Electron escape depth in silicon
journal, January 1974

Klasson, M.; Berndtsson, A.; Hedman, J.
Journal of Electron Spectroscopy and Related Phenomena, Vol. 3, Issue 6
DOI: 10.1016/0368-2048(74)80029-0

Photoelectron spectroscopy of liquid water and aqueous solution: Electron effective attenuation lengths and emission-angle anisotropy
journal, March 2010

Ottosson, Niklas; Faubel, Manfred; Bradforth, Stephen E.
Journal of Electron Spectroscopy and Related Phenomena, Vol. 177, Issue 2-3
DOI: 10.1016/j.elspec.2009.08.007

Determination of effective attenuation length of slow electrons in polymer films
journal, June 2020

Ma, J. H.; Naulleau, P.; Ahmed, M.
Journal of Applied Physics, Vol. 127, Issue 24
DOI: 10.1063/5.0007163

Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50-2000 eV range
journal, March 1994

Tanuma, S.; Powell, C. J.; Penn, D. R.
Surface and Interface Analysis, Vol. 21, Issue 3
DOI: 10.1002/sia.740210302

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Title: Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

Abstract

Citation Formats

Fundamental understanding of chemical processes in extreme ultraviolet resist materials journal, October 2018

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High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results
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journal, January 1985

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