A simple route to prepare supramolecular block copolymers using telechelic polystyrene/polydimethylsiloxane pairs

Güillen Obando, Alejandro; Chen, Yuwei; Qiang, Zhe

doi:10.1002/pi.6312

Title: A simple route to prepare supramolecular block copolymers using telechelic polystyrene/polydimethylsiloxane pairs

Journal Article · 29 October 2021 · Polymer International

DOI: https://doi.org/10.1002/pi.6312 · OSTI ID:1828428

Güillen Obando, Alejandro ^[1]; Chen, Yuwei ^[2];

^[1]

School of Polymer Science and Engineering University of Southern Mississippi Hattiesburg MS USA
Key Laboratory of Rubber‐Plastics, Ministry of Education/Shandong Provincial Key Laboratory of Rubber‐Plastics Qingdao University of Science and Technology Qingdao China

Abstract While supramolecular block copolymer (BCP) self‐assembly has been widely studied over the past decades as an effective means to generate functional nanomaterials, most of these systems require multiple steps of synthesis and processing. In this report, we introduce a facile approach to form linear multiblock copolymers by directly blending telechelic homopolymer pairs, using di‐sulfonated polystyrene and commercially available, aminopropyl terminated polydimethylsiloxane. A series of model multiblock copolymers were prepared, in which proton transfers between polymer chain ends enable the formation of strong ionic associations. These ionic junctions not only significantly enhance thin film stability of polymer blends by forming higher molecular weight copolymers, but also improve the chemical incompatibility between different segments, resulting in ordered nanostructures upon self‐assembly. These include different morphologies such as lamellae and cylinders. We also demonstrate that feature size of these BCPs can be adjusted by varying the molecular weight of the homopolymers, with a smallest domain spacing of approximately 12.9 nm being obtained. Utilizing low‐cost and widely available polymers as building blocks, our simple and efficient supramolecular assembly strategy for forming multiblock copolymers may provide a promising platform for cost‐efficient nanomanufacturing of polymeric materials. © 2021 Society of Industrial Chemistry.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1828428

Journal Information:: Polymer International, Journal Name: Polymer International Journal Issue: 4 Vol. 71; ISSN 0959-8103

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: United Kingdom

Language:: English

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