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Title: Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers

Authors:
; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE Office of Nuclear Energy (NE)
OSTI Identifier:
1805077
Grant/Contract Number:  
ACI-1532235; ACI-1532236; AC07-05ID14517; 80NSSC18K0254
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Surface Science
Additional Journal Information:
Journal Name: Applied Surface Science Journal Volume: 565 Journal Issue: C; Journal ID: ISSN 0169-4332
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Bull, Sarah K., Champ, Theodore A., Raj, Sai V., O'Brien, Robert C., Musgrave, Charles B., and Weimer, Alan W. Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers. Netherlands: N. p., 2021. Web. doi:10.1016/j.apsusc.2021.150428.
Bull, Sarah K., Champ, Theodore A., Raj, Sai V., O'Brien, Robert C., Musgrave, Charles B., & Weimer, Alan W. Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers. Netherlands. https://doi.org/10.1016/j.apsusc.2021.150428
Bull, Sarah K., Champ, Theodore A., Raj, Sai V., O'Brien, Robert C., Musgrave, Charles B., and Weimer, Alan W. Mon . "Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers". Netherlands. https://doi.org/10.1016/j.apsusc.2021.150428.
@article{osti_1805077,
title = {Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers},
author = {Bull, Sarah K. and Champ, Theodore A. and Raj, Sai V. and O'Brien, Robert C. and Musgrave, Charles B. and Weimer, Alan W.},
abstractNote = {},
doi = {10.1016/j.apsusc.2021.150428},
journal = {Applied Surface Science},
number = C,
volume = 565,
place = {Netherlands},
year = {2021},
month = {11}
}

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