Fast X-ray Nanotomography with Sub-10 nm Resolution as a Powerful Imaging Tool for Nanotechnology and Energy Storage Applications
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Northwestern Univ., Evanston, IL (United States); SLAC National Accelerator Lab., Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL)
- Northwestern Univ., Evanston, IL (United States)
- Univ. de Lille (France). Centrale Lille Inst, Institut d’Electronique, de Microélectronique et de Nanotechnologie; Univ. Polytechnique des Hauts de France (UPHF), Lille (France). YNCREA-ISEN; Univ. Paul Sabatier, Toulouse (France). Centre Interuniversitaire de Recherche et d'Ingenierie des Materiaux (CIRIMAT); Reseau sur le Stockage Electrochimique de l'Energie (RS2E), Amiens (France)
- Univ. de Lille (France). Centrale Lille Inst, Institut d’Electronique, de Microélectronique et de Nanotechnologie; Univ. Polytechnique des Hauts de France (UPHF), Lille (France). YNCREA-ISEN; Reseau sur le Stockage Electrochimique de l'Energie (RS2E), Amiens (France)
- Univ. Paul Sabatier, Toulouse (France). Centre Interuniversitaire de Recherche et d'Ingenierie des Materiaux (CIRIMAT); Reseau sur le Stockage Electrochimique de l'Energie (RS2E), Amiens (France)
In the last decade, transmission X-ray microscopes (TXMs) have come into operation in most of the synchrotrons worldwide. They have proven to be outstanding tools for non-invasive ex and in situ 3D characterization of materials at the nanoscale across varying range of scientific applications. However, their spatial resolution has not improved in many years, while newly developed functional materials and microdevices with enhanced performances exhibit nanostructures always finer. Here, optomechanical breakthroughs leading to fast 3D tomographic acquisitions (85 min) with sub-10 nm spatial resolution, narrowing the gap between X-ray and electron microscopy, are reported. These new achievements are first validated with 3D characterizations of nanolithography objects corresponding to ultrahigh-aspect-ratio hard X-ray zone plates. Then, this powerful technique is used to investigate the morphology and conformality of nanometer-thick film electrodes synthesized by atomic layer deposition and magnetron sputtering deposition methods on 3D silicon scaffolds for electrochemical energy storage applications.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States); Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); French National Research Agency (ANR)
- Grant/Contract Number:
- AC02-76SF00515; ANR-16-CE24-0012-01; AC02-06CH11357
- OSTI ID:
- 1780990
- Alternate ID(s):
- OSTI ID: 1798169
- Journal Information:
- Advanced Materials, Vol. 33, Issue 21; ISSN 0935-9648
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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