Hydroxyl Radical Suppression during Photoelectrocatalytic Water Oxidation on WO3|FeOOH

Proctor, Aaron D.; Bartlett, Bart M.

doi:10.1021/acs.jpcc.0c04820

Title: Hydroxyl Radical Suppression during Photoelectrocatalytic Water Oxidation on WO₃|FeOOH

Journal Article · 22 July 2020 · Journal of Physical Chemistry. C

DOI: https://doi.org/10.1021/acs.jpcc.0c04820 · OSTI ID:1780866

Proctor, Aaron D. ^[1];

^[2]

Univ. of Michigan, Ann Arbor, MI (United States); University of Michigan, Ann Arbor
Univ. of Michigan, Ann Arbor, MI (United States)

Depositing the earth-abundant water oxidation electrocatalyst FeOOH onto WO₃ has been shown to increase the Faradaic efficiency of the tandem WO₃|FeOOH photoanode to near 100% for the photoelectrocatalytic oxidation of water to oxygen. Here we begin to explore how this gain in Faradaic efficiency is imparted through hydroxyl radical trap and Tafel experiments. It was found that increasing the FeOOH deposition time of the WO₃|FeOOH caused a decrease in the quantity of hydroxyl radical trapped during photoelectrocatalytic water oxidation. Finally, these results, along with the disparate Tafel slopes of bare WO₃ and WO₃|FeOOH, suggest a change in the water oxidation mechanism between the two materials.

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Research Organization:: Univ. of Michigan, Ann Arbor, MI (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0006587

OSTI ID:: 1780866

Journal Information:: Journal of Physical Chemistry. C, Journal Name: Journal of Physical Chemistry. C Journal Issue: 33 Vol. 124; ISSN 1932-7447

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Title: Hydroxyl Radical Suppression during Photoelectrocatalytic Water Oxidation on WO₃|FeOOH