Sputtered Au–Ta films with tunable electrical resistivity

Bayu Aji, L. B.; Engwall, A. M.; Bae, J. H.; Baker, A. A.; Beckham, J. L.; Shin, S. J.; Lepro Chavez, X.; McCall, S. K.; Moody, J. D.; Kucheyev, S. O.

doi:10.1088/1361-6463/abc501

Title: Sputtered Au–Ta films with tunable electrical resistivity

Journal Article · 02 December 2020 · Journal of Physics. D, Applied Physics

DOI: https://doi.org/10.1088/1361-6463/abc501 · OSTI ID:1755824

^[1]; Engwall, A. M. ^[1]; Bae, J. H. ^[2];

^[1]; Beckham, J. L. ^[1]; Shin, S. J. ^[1]; Lepro Chavez, X. ^[1]; McCall, S. K. ^[1]; Moody, J. D. ^[1]; Kucheyev, S. O. ^[1]

Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
General Atomics, San Diego, CA (United States)

Gold–tantalum alloy films are attractive for hohlraums used in indirect drive magnetized inertial confinement fusion. A high electrical resistivity of over ~100 µΩ cm at cryogenic temperatures is an essential requirement for allowing an externally imposed pulsed magnetic field to soak through a hohlraum and magnetize the fusion fuel. In this work, we systematically study properties of Au–Ta alloy films in the entire compositional range from pure Au to pure Ta with thicknesses up to 30 µm. These films are made by direct current magnetron co-sputtering on planar substrates. Films are characterized by a combination of high-energy ion scattering, x-ray diffraction, electron microscopy, nanoindentation, and electrical transport measurements. Results show that an alloy with ~80 at.% of Ta forms a metallic glass exhibiting a maximum electrical resistivity of ~300 µΩ cm with a weak temperature dependence in the range of 5–400 K. The deposition of a film with ~80 at.% of Ta onto a sphero-cylindrical substrate for hohlraum fabrication is also demonstrated.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 1755824

Alternate ID(s):: OSTI ID: 1731009; OSTI ID: 23140930

Report Number(s):: LLNL-JRNL--808992; 1014972

Journal Information:: Journal of Physics. D, Applied Physics, Journal Name: Journal of Physics. D, Applied Physics Journal Issue: 7 Vol. 54; ISSN 0022-3727

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United States

Language:: English

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