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Title: Sputtered Au–Ta films with tunable electrical resistivity

Abstract

Gold–tantalum alloy films are attractive for hohlraums used in indirect drive magnetized inertial confinement fusion. A high electrical resistivity of over ~100 µΩ cm at cryogenic temperatures is an essential requirement for allowing an externally imposed pulsed magnetic field to soak through a hohlraum and magnetize the fusion fuel. In this work, we systematically study properties of Au–Ta alloy films in the entire compositional range from pure Au to pure Ta with thicknesses up to 30 µm. These films are made by direct current magnetron co-sputtering on planar substrates. Films are characterized by a combination of high-energy ion scattering, x-ray diffraction, electron microscopy, nanoindentation, and electrical transport measurements. Results show that an alloy with ~80 at.% of Ta forms a metallic glass exhibiting a maximum electrical resistivity of ~300 µΩ cm with a weak temperature dependence in the range of 5–400 K. The deposition of a film with ~80 at.% of Ta onto a sphero-cylindrical substrate for hohlraum fabrication is also demonstrated.

Authors:
ORCiD logo [1];  [1];  [2]; ORCiD logo [1];  [1];  [1];  [1];  [1];  [1];  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. General Atomics, San Diego, CA (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program
OSTI Identifier:
1755824
Alternate Identifier(s):
OSTI ID: 1731009
Report Number(s):
LLNL-JRNL-808992
Journal ID: ISSN 0022-3727; 1014972
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Physics. D, Applied Physics
Additional Journal Information:
Journal Volume: 54; Journal Issue: 7; Journal ID: ISSN 0022-3727
Publisher:
IOP Publishing
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Au-Ta alloy; thin film; magnetron sputtering

Citation Formats

Bayu Aji, L. B., Engwall, A. M., Bae, J. H., Baker, A. A., Beckham, J. L., Shin, S. J., Lepro Chavez, X., McCall, S. K., Moody, J. D., and Kucheyev, S. O.. Sputtered Au–Ta films with tunable electrical resistivity. United States: N. p., 2020. Web. https://doi.org/10.1088/1361-6463/abc501.
Bayu Aji, L. B., Engwall, A. M., Bae, J. H., Baker, A. A., Beckham, J. L., Shin, S. J., Lepro Chavez, X., McCall, S. K., Moody, J. D., & Kucheyev, S. O.. Sputtered Au–Ta films with tunable electrical resistivity. United States. https://doi.org/10.1088/1361-6463/abc501
Bayu Aji, L. B., Engwall, A. M., Bae, J. H., Baker, A. A., Beckham, J. L., Shin, S. J., Lepro Chavez, X., McCall, S. K., Moody, J. D., and Kucheyev, S. O.. Thu . "Sputtered Au–Ta films with tunable electrical resistivity". United States. https://doi.org/10.1088/1361-6463/abc501.
@article{osti_1755824,
title = {Sputtered Au–Ta films with tunable electrical resistivity},
author = {Bayu Aji, L. B. and Engwall, A. M. and Bae, J. H. and Baker, A. A. and Beckham, J. L. and Shin, S. J. and Lepro Chavez, X. and McCall, S. K. and Moody, J. D. and Kucheyev, S. O.},
abstractNote = {Gold–tantalum alloy films are attractive for hohlraums used in indirect drive magnetized inertial confinement fusion. A high electrical resistivity of over ~100 µΩ cm at cryogenic temperatures is an essential requirement for allowing an externally imposed pulsed magnetic field to soak through a hohlraum and magnetize the fusion fuel. In this work, we systematically study properties of Au–Ta alloy films in the entire compositional range from pure Au to pure Ta with thicknesses up to 30 µm. These films are made by direct current magnetron co-sputtering on planar substrates. Films are characterized by a combination of high-energy ion scattering, x-ray diffraction, electron microscopy, nanoindentation, and electrical transport measurements. Results show that an alloy with ~80 at.% of Ta forms a metallic glass exhibiting a maximum electrical resistivity of ~300 µΩ cm with a weak temperature dependence in the range of 5–400 K. The deposition of a film with ~80 at.% of Ta onto a sphero-cylindrical substrate for hohlraum fabrication is also demonstrated.},
doi = {10.1088/1361-6463/abc501},
journal = {Journal of Physics. D, Applied Physics},
number = 7,
volume = 54,
place = {United States},
year = {2020},
month = {12}
}

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Works referenced in this record:

Synthesis and characterization of Au–Ta nanocomposites for nanomechanical cantilever devices
journal, August 2007


Role of energetic atoms and ions in Ta films grown by different physical vapor deposition methods
journal, September 1993

  • Roy, R. A.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 11, Issue 5
  • DOI: 10.1116/1.586523

Spontaneous vitrification in the Au–Ta system with a small size difference
journal, August 1995

  • Pan, F.; Chen, Y. G.; Liu, B. X.
  • Applied Physics Letters, Vol. 67, Issue 6
  • DOI: 10.1063/1.115465

Intrinsic stress in sputter-deposited thin films
journal, January 1992

  • Windischmann, Henry
  • Critical Reviews in Solid State and Materials Sciences, Vol. 17, Issue 6
  • DOI: 10.1080/10408439208244586

On the metastable γ-phase uranium-molybdenum alloys
journal, January 1961


Algorithms for the rapid simulation of Rutherford backscattering spectra
journal, June 1985

  • Doolittle, Lawrence R.
  • Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 9, Issue 3
  • DOI: 10.1016/0168-583X(85)90762-1

The Electrical Resistivity of Gold Films
journal, March 1982

  • Sambles, J. R.; Elsom, K. C.; Jarvis, D. J.
  • Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, Vol. 304, Issue 1486
  • DOI: 10.1098/rsta.1982.0016

Energetic condensation: Processes, properties, and products
journal, May 1995

  • Colligon, John S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 3
  • DOI: 10.1116/1.579746

Balanced magnetic field in magnetron sputtering systems
journal, May 2017


An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments
journal, June 1992

  • Oliver, W. C.; Pharr, G. M.
  • Journal of Materials Research, Vol. 7, Issue 06, p. 1564-1583
  • DOI: 10.1557/JMR.1992.1564

Temperature dependence of conductivity arising from electron-electron interaction effects in amorphous metals
journal, October 1984


Universal behavior of magnetoconductance due to weak localization in two dimensions
journal, July 1997


Tantalum thin films deposited by ion assisted magnetron sputtering
journal, February 2008


Electrical resistivity of copper, gold, palladium, and silver
journal, October 1979

  • Matula, R. A.
  • Journal of Physical and Chemical Reference Data, Vol. 8, Issue 4, p. 1147-1298
  • DOI: 10.1063/1.555614

Occurrence of A-15 Phases
journal, October 1970

  • Luo, H. L.; Vielhaber, E.; Corenzwit, E.
  • Zeitschrift für Physik A Hadrons and nuclei, Vol. 230, Issue 5
  • DOI: 10.1007/BF01394489

Condensed hydrogen for thermonuclear fusion
journal, November 2010

  • Kucheyev, S. O.; Hamza, A. V.
  • Journal of Applied Physics, Vol. 108, Issue 9
  • DOI: 10.1063/1.3489943

Depth-sensing indentation of low-density brittle nanoporous solids
journal, July 2009


Perspectives on oblique angle deposition of thin films: From fundamentals to devices
journal, March 2016


Volume magnetic susceptibility design and hardness of Au–Ta alloys and Au–Nb alloys for MRI-compatible biomedical applications
journal, February 2017

  • Inui, Shihoko; Uyama, Emi; Hamada, Kenichi
  • Biomedical Physics & Engineering Express, Vol. 3, Issue 1
  • DOI: 10.1088/2057-1976/aa5449

The potential of imposed magnetic fields for enhancing ignition probability and fusion energy yield in indirect-drive inertial confinement fusion
journal, June 2017

  • Perkins, L. J.; Ho, D. D. -M; Logan, B. G.
  • Physics of Plasmas, Vol. 24, Issue 6
  • DOI: 10.1063/1.4985150

Factors controlling the structure of sputtered Ta films
journal, May 1973


Nanocrystalline tetragonal tantalum thin films
journal, December 2007


Preparation and properties of tantalum thin films
journal, December 1972


The electrical resistivity of dilute metallic solid solutions
journal, January 1921


Remarks on solid state amorphizing transformations
journal, June 1988


Evidence of weak localization in quantum interference effects observed in epitaxial La0.7Sr0.3MnO3 ultrathin films
journal, May 2016

  • Niu, Wei; Gao, Ming; Wang, Xuefeng
  • Scientific Reports, Vol. 6, Issue 1
  • DOI: 10.1038/srep26081

Investigation of Sputtered β-Tantalum Thin Films
journal, March 1967

  • Cook, H. C.
  • Journal of Vacuum Science and Technology, Vol. 4, Issue 2
  • DOI: 10.1116/1.1492526

Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
journal, March 2018

  • Abadias, Grégory; Chason, Eric; Keckes, Jozef
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 36, Issue 2
  • DOI: 10.1116/1.5011790

Electronic properties of γ-U and superconductivity of U–Mo alloys
journal, March 2014


On the origin of the metastable β-Ta phase stabilization in tantalum sputtered thin films
journal, March 2017