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Title: Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range

Abstract

For many years, the Mo/Si multilayer mirror has been the standard choice for normal incidence optics in the EUV/X-ray range below 20 nm. As one goes to longer wavelengths, such as the 46.9 nm Ne-like Ar X-ray laser, the absorption in Mo increases substantially, which is why the Sc/Si mirror was developed to operate in this region. To solve the problem of the metastable interface of Sc/Si mirrors due to diffusion between the two materials, this paper looks at an alternative Ge/Si multilayer mirror that replaces Sc with Ge, which offers potential advantages for fabricating a multilayer structure without the additional diffusion barriers needed with Sc. Ge can also be used to produce a narrow band filter in this wavelength regime.

Authors:
ORCiD logo
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1734366
Alternate Identifier(s):
OSTI ID: 1734976
Report Number(s):
LLNL-JRNL-810821
Journal ID: ISSN 2578-7519
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Published Article
Journal Name:
OSA Continuum
Additional Journal Information:
Journal Name: OSA Continuum Journal Volume: 3 Journal Issue: 12; Journal ID: ISSN 2578-7519
Publisher:
Optical Society of America
Country of Publication:
Country unknown/Code not available
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Nilsen, Joseph. Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range. Country unknown/Code not available: N. p., 2020. Web. https://doi.org/10.1364/osac.412213.
Nilsen, Joseph. Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range. Country unknown/Code not available. https://doi.org/10.1364/osac.412213
Nilsen, Joseph. Fri . "Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range". Country unknown/Code not available. https://doi.org/10.1364/osac.412213.
@article{osti_1734366,
title = {Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range},
author = {Nilsen, Joseph},
abstractNote = {For many years, the Mo/Si multilayer mirror has been the standard choice for normal incidence optics in the EUV/X-ray range below 20 nm. As one goes to longer wavelengths, such as the 46.9 nm Ne-like Ar X-ray laser, the absorption in Mo increases substantially, which is why the Sc/Si mirror was developed to operate in this region. To solve the problem of the metastable interface of Sc/Si mirrors due to diffusion between the two materials, this paper looks at an alternative Ge/Si multilayer mirror that replaces Sc with Ge, which offers potential advantages for fabricating a multilayer structure without the additional diffusion barriers needed with Sc. Ge can also be used to produce a narrow band filter in this wavelength regime.},
doi = {10.1364/osac.412213},
journal = {OSA Continuum},
number = 12,
volume = 3,
place = {Country unknown/Code not available},
year = {2020},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1364/osac.412213

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