Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range

Nilsen, Joseph

doi:10.1364/osac.412213

Title: Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range

Abstract

For many years, the Mo/Si multilayer mirror has been the standard choice for normal incidence optics in the EUV/X-ray range below 20 nm. As one goes to longer wavelengths, such as the 46.9 nm Ne-like Ar X-ray laser, the absorption in Mo increases substantially, which is why the Sc/Si mirror was developed to operate in this region. To solve the problem of the metastable interface of Sc/Si mirrors due to diffusion between the two materials, this paper looks at an alternative Ge/Si multilayer mirror that replaces Sc with Ge, which offers potential advantages for fabricating a multilayer structure without the additional diffusion barriers needed with Sc. Ge can also be used to produce a narrow band filter in this wavelength regime.

Authors:

Publication Date:: 2020-12-04

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Sponsoring Org.:: USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:: 1734366

Alternate Identifier(s):: OSTI ID: 1734976

Report Number(s):: LLNL-JRNL-810821
Journal ID: ISSN 2578-7519

Grant/Contract Number:: AC52-07NA27344

Resource Type:: Published Article

Journal Name:: OSA Continuum

Additional Journal Information:: Journal Name: OSA Continuum Journal Volume: 3 Journal Issue: 12; Journal ID: ISSN 2578-7519

Publisher:: Optical Society of America

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION

Citation Formats


                    Nilsen, Joseph. Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range.  United States: N. p., 2020. 
Web.  doi:10.1364/osac.412213.

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                    Nilsen, Joseph. Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range.  United States.  https://doi.org/10.1364/osac.412213

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                    Nilsen, Joseph. Fri .  
"Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range".  United States.  https://doi.org/10.1364/osac.412213.

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@article{osti_1734366,

  title        = {Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range},

  author       = {Nilsen, Joseph},

  abstractNote = {For many years, the Mo/Si multilayer mirror has been the standard choice for normal incidence optics in the EUV/X-ray range below 20 nm. As one goes to longer wavelengths, such as the 46.9 nm Ne-like Ar X-ray laser, the absorption in Mo increases substantially, which is why the Sc/Si mirror was developed to operate in this region. To solve the problem of the metastable interface of Sc/Si mirrors due to diffusion between the two materials, this paper looks at an alternative Ge/Si multilayer mirror that replaces Sc with Ge, which offers potential advantages for fabricating a multilayer structure without the additional diffusion barriers needed with Sc. Ge can also be used to produce a narrow band filter in this wavelength regime.},

  doi          = {10.1364/osac.412213},

  journal      = {OSA Continuum},

  number       = 12,

  volume       = 3,

  place        = {United States},

  year         = {2020},

  month        = {12}

}

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Works referenced in this record:

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Similar Records

Title: Designing a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range

Abstract

Citation Formats

Understanding the anomalous dispersion of doubly ionized carbon plasmas near 47nm journal, October 2008

Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser journal, January 1999

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Demonstration of a Discharge Pumped Table-Top Soft-X-Ray Laser journal, October 1994

Demonstration of a desk-top size high repetition rate soft x-ray laser journal, January 2005

Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings journal, January 2000

Characterization of diffraction gratings by use of a tabletop soft-x-ray laser journal, January 2001

Nanopatterning with interferometric lithography using a compact /spl lambda/=46.9-nm laser journal, January 2006

Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition journal, July 1997

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Repetitively pulsed X-ray laser operating on the 3 p — 3 s transition of the Ne-like argon in a capillary discharge journal, January 2003

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IMD—Software for modeling the optical properties of multilayer films journal, January 1998

Annealing induced interdiffusion and crystallization in sputtered amorphous Si/Ge multilayers journal, September 1997

Understanding the anomalous dispersion of doubly ionized carbon plasmas near 47nm
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Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser
journal, January 1999

Focusing of a tabletop soft-x-ray laser beam and laser ablation
journal, January 1999

High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35–50??nm
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Demonstration of a Discharge Pumped Table-Top Soft-X-Ray Laser
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Characterization of diffraction gratings by use of a tabletop soft-x-ray laser
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High-resolution imaging of a soft-X-ray laser beam by color centers excitation in lithium fluoride crystals
journal, September 2003

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journal, December 2004

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