Effect of atomic passivation at Ni-MoS2 interfaces on contact behaviors

Kim, Junghwan; Choi, Chang-Gyu; Min, Kyung-Ah; Cho, Kyeongjae; Hong, Suklyun

doi:10.1016/j.cap.2019.10.001

Title: Effect of atomic passivation at Ni-MoS2 interfaces on contact behaviors

Journal Article · 01 January 2020 · Current Applied Physics

DOI: https://doi.org/10.1016/j.cap.2019.10.001 · OSTI ID:1694211

Kim, Junghwan; Choi, Chang-Gyu; Min, Kyung-Ah; Cho, Kyeongjae;

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Sponsoring Organization:: USDOE Office of Electricity (OE), Advanced Grid Research & Development. Power Systems Engineering Research

OSTI ID:: 1694211

Journal Information:: Current Applied Physics, Journal Name: Current Applied Physics Journal Issue: 1 Vol. 20; ISSN 1567-1739

Publisher:: ElsevierCopyright Statement

Country of Publication:: Netherlands

Language:: English

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