Investigation of the on-site Coulomb correction and temperature dependence of the stability of U–Si phases using DFT+U

Kocevski, V.; Lopes, D. A.; Besmann, T. M.

doi:10.1016/j.jnucmat.2019.07.003

Title: Investigation of the on-site Coulomb correction and temperature dependence of the stability of U–Si phases using DFT+U

Journal Article · 01 October 2019 · Journal of Nuclear Materials

DOI: https://doi.org/10.1016/j.jnucmat.2019.07.003 · OSTI ID:1691657

Kocevski, V.; Lopes, D. A.; Besmann, T. M.

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Sponsoring Organization:: USDOE

OSTI ID:: 1691657

Journal Information:: Journal of Nuclear Materials, Journal Name: Journal of Nuclear Materials Vol. 524 Journal Issue: C; ISSN 0022-3115

Publisher:: ElsevierCopyright Statement

Country of Publication:: Netherlands

Language:: English

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