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Title: Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing

Authors:
ORCiD logo [1];  [1]; ORCiD logo [1];  [1];  [1];  [1];  [1];  [1];  [2];  [3];  [2]; ORCiD logo [1]
  1. Lawrence Livermore National Laboratory Livermore CA 94550 USA
  2. Electrical, Computer, and Energy Engineering Department University of Colorado Boulder CO 80309 USA
  3. Materials Science and Engineering Program University of Colorado Boulder CO 80303 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1669190
Grant/Contract Number:  
DE‐AC52‐07NA27344
Resource Type:
Published Article
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Cook, Caitlyn C., Fong, Erika J., Schwartz, Johanna J., Porcincula, Dominique H., Kaczmarek, Allison C., Oakdale, James S., Moran, Bryan D., Champley, Kyle M., Rackson, Charles M., Muralidharan, Archish, McLeod, Robert R., and Shusteff, Maxim. Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing. Germany: N. p., 2020. Web. doi:10.1002/adma.202003376.
Cook, Caitlyn C., Fong, Erika J., Schwartz, Johanna J., Porcincula, Dominique H., Kaczmarek, Allison C., Oakdale, James S., Moran, Bryan D., Champley, Kyle M., Rackson, Charles M., Muralidharan, Archish, McLeod, Robert R., & Shusteff, Maxim. Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing. Germany. doi:10.1002/adma.202003376.
Cook, Caitlyn C., Fong, Erika J., Schwartz, Johanna J., Porcincula, Dominique H., Kaczmarek, Allison C., Oakdale, James S., Moran, Bryan D., Champley, Kyle M., Rackson, Charles M., Muralidharan, Archish, McLeod, Robert R., and Shusteff, Maxim. Thu . "Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing". Germany. doi:10.1002/adma.202003376.
@article{osti_1669190,
title = {Highly Tunable Thiol‐Ene Photoresins for Volumetric Additive Manufacturing},
author = {Cook, Caitlyn C. and Fong, Erika J. and Schwartz, Johanna J. and Porcincula, Dominique H. and Kaczmarek, Allison C. and Oakdale, James S. and Moran, Bryan D. and Champley, Kyle M. and Rackson, Charles M. and Muralidharan, Archish and McLeod, Robert R. and Shusteff, Maxim},
abstractNote = {},
doi = {10.1002/adma.202003376},
journal = {Advanced Materials},
number = ,
volume = ,
place = {Germany},
year = {2020},
month = {10}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1002/adma.202003376

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