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Title: Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering

Abstract

Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.

Authors:
 [1];  [1];  [1];  [1];  [1];  [1];  [1];  [2];  [3];  [3]
+ Show Author Affiliations
  1. Pennsylvania State Univ., University Park, PA (United States)
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  3. Pennsylvania State Univ., University Park, PA (United States); Pennsylvania State Univ., University Park, PA (United States). Materials Research Inst.
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
OSTI Identifier:
1656502
Grant/Contract Number:  
AC02-05CH11231; MRI-1626566
Resource Type:
Accepted Manuscript
Journal Name:
MRS Communications
Additional Journal Information:
Journal Volume: 9; Journal Issue: 01; Journal ID: ISSN 2159-6859
Publisher:
Materials Research Society - Cambridge University Press
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Ye, Dan, Rongpipi, Sintu, Litofsky, Joshua H., Lee, Youngmin, Culp, Tyler E., Yoo, Sang Ha, Jackson, Thomas N., Wang, Cheng, Gomez, Esther W., and Gomez, Enrique D. Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering. United States: N. p., 2018. Web. doi:10.1557/mrc.2018.195.
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Ye, Dan, Rongpipi, Sintu, Litofsky, Joshua H., Lee, Youngmin, Culp, Tyler E., Yoo, Sang Ha, Jackson, Thomas N., Wang, Cheng, Gomez, Esther W., & Gomez, Enrique D. Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering. United States. https://doi.org/10.1557/mrc.2018.195
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Ye, Dan, Rongpipi, Sintu, Litofsky, Joshua H., Lee, Youngmin, Culp, Tyler E., Yoo, Sang Ha, Jackson, Thomas N., Wang, Cheng, Gomez, Esther W., and Gomez, Enrique D. Mon . "Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering". United States. https://doi.org/10.1557/mrc.2018.195. https://www.osti.gov/servlets/purl/1656502.
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@article{osti_1656502,
title = {Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering},
author = {Ye, Dan and Rongpipi, Sintu and Litofsky, Joshua H. and Lee, Youngmin and Culp, Tyler E. and Yoo, Sang Ha and Jackson, Thomas N. and Wang, Cheng and Gomez, Esther W. and Gomez, Enrique D.},
abstractNote = {Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.},
doi = {10.1557/mrc.2018.195},
journal = {MRS Communications},
number = 01,
volume = 9,
place = {United States},
year = {Mon Sep 17 00:00:00 EDT 2018},
month = {Mon Sep 17 00:00:00 EDT 2018}
}
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Journal Article:
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Publisher's Version of Record
https://doi.org/10.1557/mrc.2018.195
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