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Title: Chemical and photoelectrochemical instability of amorphous TiO 2 layers quantified by spectroscopic ellipsometry

Abstract

The degradation of TiO 2 coatings is quantified, considering pH, temperature, illumination and operating times relevant to practical photoelectrochemical devices.

Authors:
ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [1]
  1. Helmholtz-Zentrum Geesthacht, Centre for Materials and Coastal Research GmbH, D-21502 Geesthacht, Germany
  2. Helmholtz-Zentrum Geesthacht, Centre for Materials and Coastal Research GmbH, D-21502 Geesthacht, Germany, University of the Federal Armed Forces
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1650394
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Published Article
Journal Name:
Journal of Materials Chemistry. A
Additional Journal Information:
Journal Name: Journal of Materials Chemistry. A Journal Volume: 8 Journal Issue: 35; Journal ID: ISSN 2050-7488
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Kriegel, H., Kollmann, J., Raudsepp, R., Klassen, T., and Schieda, M.. Chemical and photoelectrochemical instability of amorphous TiO 2 layers quantified by spectroscopic ellipsometry. United Kingdom: N. p., 2020. Web. https://doi.org/10.1039/D0TA04878J.
Kriegel, H., Kollmann, J., Raudsepp, R., Klassen, T., & Schieda, M.. Chemical and photoelectrochemical instability of amorphous TiO 2 layers quantified by spectroscopic ellipsometry. United Kingdom. https://doi.org/10.1039/D0TA04878J
Kriegel, H., Kollmann, J., Raudsepp, R., Klassen, T., and Schieda, M.. Tue . "Chemical and photoelectrochemical instability of amorphous TiO 2 layers quantified by spectroscopic ellipsometry". United Kingdom. https://doi.org/10.1039/D0TA04878J.
@article{osti_1650394,
title = {Chemical and photoelectrochemical instability of amorphous TiO 2 layers quantified by spectroscopic ellipsometry},
author = {Kriegel, H. and Kollmann, J. and Raudsepp, R. and Klassen, T. and Schieda, M.},
abstractNote = {The degradation of TiO 2 coatings is quantified, considering pH, temperature, illumination and operating times relevant to practical photoelectrochemical devices.},
doi = {10.1039/D0TA04878J},
journal = {Journal of Materials Chemistry. A},
number = 35,
volume = 8,
place = {United Kingdom},
year = {2020},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1039/D0TA04878J

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Works referenced in this record:

Photocorrosion Mechanism of TiO 2 -Coated Photoanodes
journal, January 2015

  • Didden, Arjen; Hillebrand, Philipp; Dam, Bernard
  • International Journal of Photoenergy, Vol. 2015
  • DOI: 10.1155/2015/457980

Degradation in photoelectrochemical devices: review with an illustrative case study
journal, February 2017

  • Nandjou, Fredy; Haussener, Sophia
  • Journal of Physics D: Applied Physics, Vol. 50, Issue 12
  • DOI: 10.1088/1361-6463/aa5b11

Space-Limited Crystal Growth Mechanism of TiO 2 Films by Atomic Layer Deposition
journal, March 2010

  • Lee, Wen-Jen; Hon, Min-Hsiung
  • The Journal of Physical Chemistry C, Vol. 114, Issue 15
  • DOI: 10.1021/jp911210q

Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices
journal, November 2018


Electrolytic decomposition and photodecomposition of compound semiconductors in contact with electrolytes
journal, July 1978

  • Gerischer, Heinz
  • Journal of Vacuum Science and Technology, Vol. 15, Issue 4
  • DOI: 10.1116/1.569800

Anatase Coarsening Kinetics under Hydrothermal Conditions As a Function of Ph and Temperature
journal, May 2008

  • Finnegan, Michael P.; Zhang, Hengzhong; Banfield, Jillian F.
  • Chemistry of Materials, Vol. 20, Issue 10
  • DOI: 10.1021/cm071057o

Interpretation of Cyclic Voltammetry Measurements of Thin Semiconductor Films for Solar Fuel Applications
journal, March 2013

  • Bertoluzzi, Luca; Badia-Bou, Laura; Fabregat-Santiago, Francisco
  • The Journal of Physical Chemistry Letters, Vol. 4, Issue 8
  • DOI: 10.1021/jz400573t

Calculation of the solubility of TiO2 and titanates in sulfuric acid solutions
journal, September 2014

  • Kramer, S. M.; Gorichev, I. G.; Lainer, Yu. A.
  • Russian Metallurgy (Metally), Vol. 2014, Issue 9
  • DOI: 10.1134/S0036029514090109

Stabilization of n-cadmium telluride photoanodes for water oxidation to O 2 (g) in aqueous alkaline electrolytes using amorphous TiO 2 films formed by atomic-layer deposition
journal, January 2014

  • Lichterman, Michael F.; Carim, Azhar I.; McDowell, Matthew T.
  • Energy Environ. Sci., Vol. 7, Issue 10
  • DOI: 10.1039/C4EE01914H

Dissolution Kinetics of TiO2 in HF-HC1 Solutions
journal, December 1987


Thermodynamic Oxidation and Reduction Potentials of Photocatalytic Semiconductors in Aqueous Solution
journal, September 2012

  • Chen, Shiyou; Wang, Lin-Wang
  • Chemistry of Materials, Vol. 24, Issue 18
  • DOI: 10.1021/cm302533s

Similarity Between Amorphous and Crystalline Phases: The Case of TiO 2
journal, May 2018

  • Mavračić, Juraj; Mocanu, Felix C.; Deringer, Volker L.
  • The Journal of Physical Chemistry Letters, Vol. 9, Issue 11
  • DOI: 10.1021/acs.jpclett.8b01067

Wet Etching of Amorphous TiO 2 Thin Films Using H 3 PO 4 –H 2 O 2 Aqueous Solution
journal, September 2013

  • Okazaki, Sohei; Ohhashi, Takuya; Nakao, Shoichiro
  • Japanese Journal of Applied Physics, Vol. 52, Issue 9R
  • DOI: 10.7567/JJAP.52.098002

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
journal, March 2009


Thin-Film Materials for the Protection of Semiconducting Photoelectrodes in Solar-Fuel Generators
journal, October 2015

  • Hu, Shu; Lewis, Nathan S.; Ager, Joel W.
  • The Journal of Physical Chemistry C, Vol. 119, Issue 43
  • DOI: 10.1021/acs.jpcc.5b05976

Optimization and Stabilization of Electrodeposited Cu 2 ZnSnS 4 Photocathodes for Solar Water Reduction
journal, July 2013

  • Rovelli, Lorenzo; Tilley, S. David; Sivula, Kevin
  • ACS Applied Materials & Interfaces, Vol. 5, Issue 16
  • DOI: 10.1021/am402096r

Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles
journal, October 2010


Transmission electron microscopy studies of atomic layer deposition TiO2 films grown on silicon
journal, September 2003


Ultrathin films on copper(i) oxide water splitting photocathodes: a study on performance and stability
journal, January 2012

  • Paracchino, Adriana; Mathews, Nripan; Hisatomi, Takashi
  • Energy & Environmental Science, Vol. 5, Issue 9
  • DOI: 10.1039/c2ee22063f

Silicon protected with atomic layer deposited TiO2: durability studies of photocathodic H2 evolution
journal, January 2013

  • Seger, Brian; Tilley, David S.; Pedersen, Thomas
  • RSC Advances, Vol. 3, Issue 48
  • DOI: 10.1039/c3ra45966g

Synthesis of Uniform Anatase TiO2 Nanoparticles by the Gel–Sol Method
journal, August 2002

  • Sugimoto, Tadao; Zhou, Xingping
  • Journal of Colloid and Interface Science, Vol. 252, Issue 2
  • DOI: 10.1006/jcis.2002.8480

Water Oxidation at Hematite Photoelectrodes: The Role of Surface States
journal, February 2012

  • Klahr, Benjamin; Gimenez, Sixto; Fabregat-Santiago, Francisco
  • Journal of the American Chemical Society, Vol. 134, Issue 9
  • DOI: 10.1021/ja210755h

Structural absorption by barbule microstructures of super black bird of paradise feathers
journal, January 2018


Microscopic Study of Atomic Layer Deposition of TiO 2 on GaAs and Its Photocatalytic Application
journal, November 2015


Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation
journal, June 2011

  • Chen, Yi Wei; Prange, Jonathan D.; Dühnen, Simon
  • Nature Materials, Vol. 10, Issue 7
  • DOI: 10.1038/nmat3047

Amorphous TiO2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation
journal, May 2014


Charge Transfer Characterization of ALD-Grown TiO 2 Protective Layers in Silicon Photocathodes
journal, May 2017

  • Ros, Carles; Andreu, Teresa; Hernández-Alonso, María Dolores
  • ACS Applied Materials & Interfaces, Vol. 9, Issue 21
  • DOI: 10.1021/acsami.7b02996

Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin film photovoltaics
journal, September 2002

  • Ferlauto, A. S.; Ferreira, G. M.; Pearce, J. M.
  • Journal of Applied Physics, Vol. 92, Issue 5
  • DOI: 10.1063/1.1497462

Improved Stability of Atomic Layer Deposited Amorphous TiO 2 Photoelectrode Coatings by Thermally Induced Oxygen Defects
journal, February 2018


Silicon protected with atomic layer deposited TiO2: conducting versus tunnelling through TiO2
journal, January 2013

  • Seger, Brian; Tilley, S. David; Pedersen, Thomas
  • Journal of Materials Chemistry A, Vol. 1, Issue 47
  • DOI: 10.1039/c3ta12309j

Thermodynamics of the dissolution of amorphous and polymorphic TiO2 modifications in acid and alkaline media
journal, February 2016


Ti(IV) hydrolysis constants derived from rutile solubility measurements made from 100 to 300°C
journal, July 2001


Wet Etching of TiO 2 -Based Precursor Amorphous Films for Transparent Electrodes
journal, January 2011

  • Ohkubo, Junpei; Hirose, Yasushi; Sakai, Enju
  • Japanese Journal of Applied Physics, Vol. 50
  • DOI: 10.1143/JJAP.50.018002

Spectroscopic ellipsometry characterization of HfxSiyOz films using the Cody–Lorentz parameterized model
journal, September 2004

  • Price, J.; Hung, P. Y.; Rhoad, T.
  • Applied Physics Letters, Vol. 85, Issue 10
  • DOI: 10.1063/1.1784889

Kinetics of anatase phase formation in TiO2 films during atomic layer deposition and post-deposition annealing
journal, January 2013

  • Luka, Grzegorz; Witkowski, Bartlomiej S.; Wachnicki, Lukasz
  • CrystEngComm, Vol. 15, Issue 46
  • DOI: 10.1039/c3ce40893k

Ion Pair Formation and Primary Charging Behavior of Titanium Oxide (Anatase and Rutile)
journal, February 2001

  • Bourikas, K.; Hiemstra, T.; Van Riemsdijk, W. H.
  • Langmuir, Vol. 17, Issue 3
  • DOI: 10.1021/la000806c

Potentiometric Titrations of Rutile Suspensions to 250°C
journal, April 1998

  • Machesky, Michael L.; Wesolowski, David J.; Palmer, Donald A.
  • Journal of Colloid and Interface Science, Vol. 200, Issue 2
  • DOI: 10.1006/jcis.1997.5401

Parameterization of the optical functions of amorphous materials in the interband region
journal, July 1996

  • Jellison, G. E.; Modine, F. A.
  • Applied Physics Letters, Vol. 69, Issue 3
  • DOI: 10.1063/1.118064

Ti Anodization in Alkaline Electrolyte: The Relationship between Transport of Defects, Film Hydration and Composition
journal, January 2013

  • Acevedo-Peña, Próspero; Vazquez-Arenas, Jorge; Cabrera-Sierra, Román
  • Journal of The Electrochemical Society, Vol. 160, Issue 6
  • DOI: 10.1149/2.063306jes

Charge transfer processes at the semiconductor/electrolyte interface for solar fuel production: insight from impedance spectroscopy
journal, January 2016

  • Bertoluzzi, Luca; Lopez-Varo, Pilar; Jiménez Tejada, Juan Antonio
  • Journal of Materials Chemistry A, Vol. 4, Issue 8
  • DOI: 10.1039/C5TA03210E

On the stability of semiconductor electrodes against photodecomposition
journal, September 1977


Thermodynamic Potential for the Anodic Dissolution of n-Type Semiconductors
journal, January 1977

  • Bard, Allen J.
  • Journal of The Electrochemical Society, Vol. 124, Issue 11
  • DOI: 10.1149/1.2133140

Using TiO 2 as a Conductive Protective Layer for Photocathodic H 2 Evolution
journal, January 2013

  • Seger, Brian; Pedersen, Thomas; Laursen, Anders B.
  • Journal of the American Chemical Society, Vol. 135, Issue 3
  • DOI: 10.1021/ja309523t