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Title: Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions

Abstract

An oxide layer with a known thickness and chemistry was grown on delta stabilized Pu and sputtered with 1–5 keV Ar+ ions over a range of incident ion angle between 22° and 72°. From the time required to remove the oxide layer, sputter yields of PuO2 were calculated. The sputter yields appear to increase with higher Ar+ ion beam energy in the range of 1–5 keV at an incident sputter ion angle of 42° and were found to increase with a decreasing angle of incidence up to 62°. The degree of oxide reduction induced during the sputter process was found to vary with the incident sputter ion angle.

Authors:
; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1643193
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology A
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 38 Journal Issue: 5; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Donald, Scott B., Stanford, Jeff A., Gollott, Rory T., Roberts, David J., Nelson, Art J., and McLean, W. Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions. United States: N. p., 2020. Web. doi:10.1116/6.0000301.
Donald, Scott B., Stanford, Jeff A., Gollott, Rory T., Roberts, David J., Nelson, Art J., & McLean, W. Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions. United States. https://doi.org/10.1116/6.0000301
Donald, Scott B., Stanford, Jeff A., Gollott, Rory T., Roberts, David J., Nelson, Art J., and McLean, W. Mon . "Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions". United States. https://doi.org/10.1116/6.0000301.
@article{osti_1643193,
title = {Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions},
author = {Donald, Scott B. and Stanford, Jeff A. and Gollott, Rory T. and Roberts, David J. and Nelson, Art J. and McLean, W.},
abstractNote = {An oxide layer with a known thickness and chemistry was grown on delta stabilized Pu and sputtered with 1–5 keV Ar+ ions over a range of incident ion angle between 22° and 72°. From the time required to remove the oxide layer, sputter yields of PuO2 were calculated. The sputter yields appear to increase with higher Ar+ ion beam energy in the range of 1–5 keV at an incident sputter ion angle of 42° and were found to increase with a decreasing angle of incidence up to 62°. The degree of oxide reduction induced during the sputter process was found to vary with the incident sputter ion angle.},
doi = {10.1116/6.0000301},
journal = {Journal of Vacuum Science and Technology A},
number = 5,
volume = 38,
place = {United States},
year = {Mon Jul 27 00:00:00 EDT 2020},
month = {Mon Jul 27 00:00:00 EDT 2020}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1116/6.0000301

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Cited by: 5 works
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