Title: Metal-ion-controlled growth and nanoindentation response of 3D, bicontinuous Cu–Fe thin films

Abstract

Bicontinuous, nanocomposite thin film morphologies depend largely on the deposition conditions applied during physical vapor deposition. With the introduction of high power impulse magnetron sputtering (HiPIMS), the range of potential morphologies achieved during deposition has been increased. In this work, we compare the deposition outcomes between traditional direct-current magnetron sputtering (DCMS) and HiPIMS for a thin film co deposit of Cu and Fe. Modular control of the columnarity, porosity and roughness was achieved by varying the Cu and Fe metal ion currents during deposition. The directionality of the nanostructured phase-separated morphology was also controlled as the ion current increased. At zero ion current for both Cu and Fe sputtered species during DCMS, the film exhibited lateral concentration modulations of Cu and Fe. The directionality of the Cu- and Fe-rich phases shifted to vertical concentration modulations at low ion currents of I_Fe = 1A and I_Cu = 0:1A and to lateral concentration modulations at relatively moderate ion currents of I_Fe = 5A and I_Cu = 2A: At high ion currents of I_Fe = 18A and I_Cu = 2A; a more randomized phase domain structure was observed on the nanoscale. This structural shift is rationalized using an interdiffusion model. Here, the rolemore » of different kinds of phase separated morphologies, achieved during DCMS deposition, on the mechanical properties has also been studied. Results indicated increase in hardness, indentation modulus and flow strength values with the increase in indentation strain rates. Bicontinuous Cu-Fe nanocomposites are found to be stronger than multilayer Cu-Fe samples.« less

Authors:

Derby, Benjamin K.  ^[1];

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• Search DOE PAGES for ORCID "0000-0003-4692-4615"

Chatterjee, Arya ^[1]; Misra, Amit ^[1]

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+ Show Author Affiliations

1. Univ. of Michigan, Ann Arbor, MI (United States)

Publication Date:

Fri Jul 17 00:00:00 EDT 2020

Research Org.:

Univ. of Michigan, Ann Arbor, MI (United States)

Sponsoring Org.:

USDOE National Nuclear Security Administration (NNSA)

OSTI Identifier:

1639910

Alternate Identifier(s):

OSTI ID: 1638901

Grant/Contract Number:  

NA0003857

Resource Type:

Accepted Manuscript

Journal Name:

Journal of Applied Physics

Additional Journal Information:

Journal Volume: 128; Journal Issue: 3; Journal ID: ISSN 0021-8979

Publisher:

American Institute of Physics (AIP)

Country of Publication:

United States

Language:

English

Subject:

36 MATERIALS SCIENCE; Physical vapor deposition; sputter deposition; surface physics; nano-indentation; phase transitions; ions and properties; thin films; magnetron sputtering; nanocomposites