A Thin Alumina Film as a Tritium Adsorption Inhibitor for Stainless Steel 316

Journal Article · 30 March 2020 · Fusion Science and Technology

DOI: https://doi.org/10.1080/15361055.2020.1714409 · OSTI ID:1634030

Fagan, C.  ^[1]; Sharpe, M. ^[1]; Shmayda, W. T. ^[1]; Schröder, W. U. ^[1]

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1. Univ. of Rochester, NY (United States). Lab. for Laser Energetics

The effect of a thin alumina coating on stainless-steel 316 (SS316) samples on tritium adsorption and transport are discussed. Compact films of alumina were produced on the surfaces of pristine SS316 samples using an atomic layer deposition (ALD) technique. Subsequently, these samples were exposed for 24 hours to a deuterium-tritium gas mixture (P_T=0.5 atm, 25°C). A combination of methods including selective-etching and programmed thermal desorption were employed to assess both, the depth profile of the tritium concentration in the sample and the total quantity of tritium absorbed respectively. Tritium was quantitatively determined through the measurement of beta radioactivity using liquid-scintillation counting techniques. Data suggest that SS316 with a thin film of alumina reduces the total tritium uptake by ~25% relative to uncoated samples. Significantly, such films appear to reduce, by a factor of 200, tritium diffusion into SS316 and therefore constitute an effective barrier against tritium transport. This observation is of practical importance for tritium and, generally, reactive gas handling.

• Research Organization: Univ. of Rochester, NY (United States). Lab. for Laser Energetics
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• Grant/Contract Number: NA0003856
• OSTI ID: 1634030
• Report Number(s): 2018-314, 1569, 2525; 2018-314, 1569, 2525; TRN: US2201286
• Journal Information: Fusion Science and Technology, Vol. 76, Issue 4; Conference: 12. International Conference on Tritium Science and Technology, Busan (Korea), 22-26 Apr 2019; ISSN 1536-1055
• Publisher: American Nuclear SocietyCopyright Statement
• Country of Publication: United States
• Language: English