Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition

Yanguas-Gil, Angel

doi:10.1116/1.5141355

Title: Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition

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Abstract

In this work, the authors explore the impact that thermodynamic fluctuations have on the spontaneous appearance of defects during area selective deposition on patterned surfaces that are fully covered by adsorbates under local thermodynamic equilibrium, such as self-assembled monolayers. By using a simple lattice gas model for the adsorbed monolayer, the authors were able to track the spontaneous formation of defects in the monolayer as a function of the pattern width. The results indicate that, for pattern widths of the order of tens of nanometers, roughening effects at the pattern edge can be the leading source for the spontaneous appearance of nucleation defects. This leads to an enhancement of the density of defects that can be up to three orders of magnitude higher than those expected in uniform (not patterned) surfaces. The model also predicts a density of defects that is inversely proportional to the pattern width. Finally, if the dynamic nucleation of defects during area selective deposition is driven by thermodynamic fluctuations, the model predicts that the nucleation rate should be proportional to the total precursor fluency and independent of purge times. Moreover, a tight confinement of the monolayer through a high quality smooth interface in the patterned substratemore »« less

Authors:

^[1]

Argonne National Lab. (ANL), Argonne, IL (United States). Applied Materials Division

Publication Date:: 2020-03-06

Research Org.:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1632314

Alternate Identifier(s):: OSTI ID: 1603387

Grant/Contract Number:: AC02-06CH11357

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology A

Additional Journal Information:: Journal Volume: 38; Journal Issue: 3; Journal ID: ISSN 0734-2101

Publisher:: American Vacuum Society / AIP

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; Statistical thermodynamics; Atomic layer deposition; Lithography; Surface and interface chemistry; Monte Carlo methods

Citation Formats


                    Yanguas-Gil, Angel. Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition.  United States: N. p., 2020. 
Web.  doi:10.1116/1.5141355.

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                    Yanguas-Gil, Angel. Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition.  United States.  https://doi.org/10.1116/1.5141355

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                    Yanguas-Gil, Angel. Fri .  
"Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition".  United States.  https://doi.org/10.1116/1.5141355.  https://www.osti.gov/servlets/purl/1632314.

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@article{osti_1632314,

  title        = {Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition},

  author       = {Yanguas-Gil, Angel},

  abstractNote = {In this work, the authors explore the impact that thermodynamic fluctuations have on the spontaneous appearance of defects during area selective deposition on patterned surfaces that are fully covered by adsorbates under local thermodynamic equilibrium, such as self-assembled monolayers. By using a simple lattice gas model for the adsorbed monolayer, the authors were able to track the spontaneous formation of defects in the monolayer as a function of the pattern width. The results indicate that, for pattern widths of the order of tens of nanometers, roughening effects at the pattern edge can be the leading source for the spontaneous appearance of nucleation defects. This leads to an enhancement of the density of defects that can be up to three orders of magnitude higher than those expected in uniform (not patterned) surfaces. The model also predicts a density of defects that is inversely proportional to the pattern width. Finally, if the dynamic nucleation of defects during area selective deposition is driven by thermodynamic fluctuations, the model predicts that the nucleation rate should be proportional to the total precursor fluency and independent of purge times. Moreover, a tight confinement of the monolayer through a high quality smooth interface in the patterned substrate and strong cohesive interactions between adsorbates should each contribute to a reduction of the overall defect density.},

  doi          = {10.1116/1.5141355},

  journal      = {Journal of Vacuum Science and Technology A},

  number       = 3,

  volume       = 38,

  place        = {United States},

  year         = {2020},

  month        = {3}

}

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