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Title: Controlling antiferromagnetic domains in patterned La 0.7 Sr 0.3 FeO 3 thin films

Authors:
ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [3]; ORCiD logo [4]; ORCiD logo [1]
  1. Department of Materials Science and Engineering, University of California, Davis, California 95616, USA
  2. Department of Materials Science and Engineering, University of California, Davis, California 95616, USA, Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94703, USA
  3. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94703, USA
  4. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1630456
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 127 Journal Issue: 20; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Lee, Michael S., Lyu, Peifen, Chopdekar, Rajesh V., Scholl, Andreas, Retterer, Scott T., and Takamura, Yayoi. Controlling antiferromagnetic domains in patterned La 0.7 Sr 0.3 FeO 3 thin films. United States: N. p., 2020. Web. doi:10.1063/5.0006228.
Lee, Michael S., Lyu, Peifen, Chopdekar, Rajesh V., Scholl, Andreas, Retterer, Scott T., & Takamura, Yayoi. Controlling antiferromagnetic domains in patterned La 0.7 Sr 0.3 FeO 3 thin films. United States. doi:https://doi.org/10.1063/5.0006228
Lee, Michael S., Lyu, Peifen, Chopdekar, Rajesh V., Scholl, Andreas, Retterer, Scott T., and Takamura, Yayoi. Fri . "Controlling antiferromagnetic domains in patterned La 0.7 Sr 0.3 FeO 3 thin films". United States. doi:https://doi.org/10.1063/5.0006228.
@article{osti_1630456,
title = {Controlling antiferromagnetic domains in patterned La 0.7 Sr 0.3 FeO 3 thin films},
author = {Lee, Michael S. and Lyu, Peifen and Chopdekar, Rajesh V. and Scholl, Andreas and Retterer, Scott T. and Takamura, Yayoi},
abstractNote = {},
doi = {10.1063/5.0006228},
journal = {Journal of Applied Physics},
number = 20,
volume = 127,
place = {United States},
year = {2020},
month = {5}
}

Journal Article:
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This content will become publicly available on May 22, 2021
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