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Title: Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations

Journal Article · · PLoS ONE
ORCiD logo [1];  [2]
  1. Northwestern Univ., Evanston, IL (United States). Northwestern Univ. Libraries; DOE/OSTI
  2. Argonne National Lab. (ANL), Argonne, IL (United States). Energy Systems Division

This paper describes how Atomic Layer Deposition (ALD) has evolved over time using a combination of bibliometric, social network, and text analysis. We examined the rate of knowledge production as well as changes in authors, journals, and collaborators, showing a steady growth of ALD research. The study of the collaboration network of ALD scientists over time points out that the ALD research community is becoming larger and more interconnected, with a largest connected component that spans 90% of the authors in 2015. In addition, the evolution of network centrality measures (degree and betweenness centrality) and author productivity revealed the central figures in ALD over time, including new “stars” appearing in the last decade. Finally, the study of the title words in our dataset is consistent with a shift in focus on research topics towards energy applications and nanotechnology.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1627845
Journal Information:
PLoS ONE, Journal Name: PLoS ONE Journal Issue: 1 Vol. 13; ISSN 1932-6203
Publisher:
Public Library of ScienceCopyright Statement
Country of Publication:
United States
Language:
English

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Atomic layer deposition for nonconventional nanomaterials and their applications journal November 2019