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Title: Conformal SnO x heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones

Abstract

A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.

Authors:
ORCiD logo [1];  [2]; ORCiD logo [1];  [3]; ORCiD logo [4]; ORCiD logo [5]
  1. Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, USA
  2. Division of Engineering and Applied Sciences, California Institute of Technology, Pasadena, USA
  3. Division of Engineering and Applied Sciences, California Institute of Technology, Pasadena, USA, Kavli Nanoscience Institute
  4. Beckman Institute Molecular Materials Research Center, California Institute of Technology, Pasadena, USA
  5. Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, USA, Beckman Institute Molecular Materials Research Center
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1616621
Grant/Contract Number:  
SC0004993
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Materials Chemistry. A
Additional Journal Information:
Journal Name: Journal of Materials Chemistry. A Journal Volume: 8 Journal Issue: 18; Journal ID: ISSN 2050-7488
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Moreno-Hernandez, Ivan A., Yalamanchili, Sisir, Fu, Harold J., Atwater, Harry A., Brunschwig, Bruce S., and Lewis, Nathan S. Conformal SnO x heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones. United Kingdom: N. p., 2020. Web. doi:10.1039/D0TA01144D.
Moreno-Hernandez, Ivan A., Yalamanchili, Sisir, Fu, Harold J., Atwater, Harry A., Brunschwig, Bruce S., & Lewis, Nathan S. Conformal SnO x heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones. United Kingdom. doi:https://doi.org/10.1039/D0TA01144D
Moreno-Hernandez, Ivan A., Yalamanchili, Sisir, Fu, Harold J., Atwater, Harry A., Brunschwig, Bruce S., and Lewis, Nathan S. Tue . "Conformal SnO x heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones". United Kingdom. doi:https://doi.org/10.1039/D0TA01144D.
@article{osti_1616621,
title = {Conformal SnO x heterojunction coatings for stabilized photoelectrochemical water oxidation using arrays of silicon microcones},
author = {Moreno-Hernandez, Ivan A. and Yalamanchili, Sisir and Fu, Harold J. and Atwater, Harry A. and Brunschwig, Bruce S. and Lewis, Nathan S.},
abstractNote = {A protective tin oxide layer formed by atomic-layer deposition limits surface recombination at n-Si surfaces and produces ∼620 mV of photovoltage on planar n-Si photoanodes. The layer conformally coats structures such as Si microcone arrays.},
doi = {10.1039/D0TA01144D},
journal = {Journal of Materials Chemistry. A},
number = 18,
volume = 8,
place = {United Kingdom},
year = {2020},
month = {5}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: https://doi.org/10.1039/D0TA01144D

Citation Metrics:
Cited by: 1 work
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