Title: Bending Rigidity of 2D Silica

Journal Article · · Physical Review Letters
 [1];  [2];  [3];  [1];  [4];  [4];  [5];  [1];  [2];  [1]
  1. Fritz-Haber-Inst. der Max-Planck-Gesellschaft, Berlin (Germany)
  2. Univ. of Bergen, Bergen (Norway)
  3. NTNU Norwegian Univ. of Science and Technology, Tronheim (Norway)
  4. Univ. di Milano-Bicocca, Milan (Italy)
  5. Clemson Univ., SC (United States); Donostia International Physics Center (DIPC), Donostia-San Sebastian (Spain)
+ Show Author Affiliations

A chemically stable bilayers of SiO2 (2D silica) is a new, wide band gap 2D material. Up till now graphene has been the only 2D material where the bending rigidity has been measured. Here we present inelastic helium atom scattering data from 2D silica on Ru(0001) and extract the first bending rigidity, κ, measurements for a nonmonoatomic 2D material of definable thickness. We find a value of κ = 8.8 eV ± 0.5 eV which is of the same order of magnitude as theoretical values in the literature for freestanding crystalline 2D silica.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
European Union (EU); German Research Council; Research Council of Norway; USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Chemical Sciences, Geosciences & Biosciences Division
Grant/Contract Number:
AC02-05CH11231
OSTI ID:
1615273
Journal Information:
Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 22 Vol. 120; ISSN 0031-9007; ISSN PRLTAO
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English

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Cited By (2)

Stone–Wales defect interaction in quasistatically deformed 2D silica journal December 2019
Taxonomy through the lens of neutral helium microscopy journal February 2019

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