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Title: Numerical model of the radio-frequency magnetic presheath including wall impurities

Journal Article · · Physics of Plasmas
DOI: https://doi.org/10.1063/1.5109256 · OSTI ID:1612838
 [1];  [2]; ORCiD logo [3]; ORCiD logo [4]; ORCiD logo [5]
  1. Univ. of Illinois at Urbana-Champaign, IL (United States); DOE/OSTI
  2. Univ. of Illinois at Urbana-Champaign, IL (United States)
  3. Tech-X Corp., Boulder, CO (United States)
  4. Lodestar Research Corporation, Boulder, CO (United States)
  5. Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)

Here, we present a numerical fluid plasma model able to capture the enhanced sputtering yield from the Faraday Screen and the Plasma-Facing Components of an Ion Cyclotron Resonance Heating antenna in a fusion machine. The model is a one-dimensional phase-resolved representation of a rectified radio frequency sheath in a magnetic field at an angle with respect to the material surface; the momentum transport of both ions and impurities is computed in the model. The sputtering behavior of the impurities coming off from the wall is obtained from the plasma-material interaction code Fractal-Tridyn. This study analyzes a range of magnetic angles and wave frequencies to parametrically investigate their effect on the energy-angle distributions of the impacting ions and sputtered impurities. Finally, an estimate of the impurity fluxes and of the gross-erosion rate is provided and compared with experimental data available in the literature.

Research Organization:
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Advanced Scientific Computing Research (ASCR) (SC-21). Scientific Discovery through Advanced Computing (SciDAC); USDOE Office of Science (SC), Fusion Energy Sciences (FES) (SC-24)
Grant/Contract Number:
SC0018090
OSTI ID:
1612838
Journal Information:
Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 9 Vol. 26; ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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