Nearly monoenergetic positive ion beam with self-neutralized space charge extracted from a pulsed plasma

Chen, Ya-Ming; Sawadichai, Ryan; Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.

doi:10.1088/1361-6463/ab294e

Title: Nearly monoenergetic positive ion beam with self-neutralized space charge extracted from a pulsed plasma

Journal Article · 04 July 2019 · Journal of Physics. D, Applied Physics

DOI: https://doi.org/10.1088/1361-6463/ab294e · OSTI ID:1612095

^[1]; Sawadichai, Ryan ^[1]; Tian, Siyuan ^[1];

^[1]; Ruchhoeft, Paul ^[1];

^[1]

Univ. of Houston, TX (United States)

Not provided.A nearly monoenergetic Ar⁺ ion beam (100 eV peak energy, 3.5 eV full width at half maximum), with self-neutralized space charge, was extracted from a power modulated (pulsed) inductively coupled plasma (ICP), through a single grounded grid. The beam energy was set by applying a synchronous DC bias voltage to a boundary electrode in contact with the plasma, in the late afterglow of the power pulse. A retarding field energy analyzer and a movable Faraday cup were used to measure the ion energy distribution (IED) and the time resolved ion and electron current densities, as a function of position along the beam axis, to unravel the mechanism of self-neutralization of the space charge of the beam. When a +100 V DC bias was applied to the boundary electrode during the afterglow, a ~100 eV beam (ion density ~10⁹ cm^-3) emerged that was space-charge neutralized by periodic injection of electrons, mainly during the early afterglow, into the region downstream of the extraction grid. A background plasma (electron density ~10¹⁰ cm^-3) was formed by these electrons, in conjunction with relatively low-energy ions (1–10 eV) that flew out of the ICP when the DC bias was off, as well as formed by resonant charge exchange of the 100 eV beam ions with the background Ar in the downstream region near the extraction grid. The behavior of the beam IED as a function of pressure and power of the ICP as well as the timing of application of the DC bias voltage was also studied.

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Research Organization:: Univ. of Michigan, Ann Arbor, MI (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: SC0014132

OSTI ID:: 1612095

Journal Information:: Journal of Physics. D, Applied Physics, Vol. 52, Issue 35; ISSN 0022-3727

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United States

Language:: English

References (23)

Nanopantography: A New Method for Massively Parallel Nanopatterning over Large Areas Xu, Lin; Vemula, Sri C.; Jain, Manish Nano Letters, Vol. 5, Issue 12 https://doi.org/10.1021/nl051976i	journal	December 2005
Low Energy Ion Beam Etching Harper, J. M. E. Journal of The Electrochemical Society, Vol. 128, Issue 5 https://doi.org/10.1149/1.2127554	journal	January 1981
Etching of nanopatterns in silicon using nanopantography Xu, Lin; Nasrullah, Azeem; Chen, Zhiying Applied Physics Letters, Vol. 92, Issue 1 https://doi.org/10.1063/1.2828208	journal	January 2008
Generation of forerunner electron beam during interaction of ion beam pulse with plasma Hara, Kentaro; Kaganovich, Igor D.; Startsev, Edward A. Physics of Plasmas, Vol. 25, Issue 1 https://doi.org/10.1063/1.5002688	journal	January 2018
Transfer of nanopantography-defined patterns using highly selective plasma etching Tian, Siyuan; Donnelly, Vincent M.; Economou, Demetre J. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 33, Issue 3 https://doi.org/10.1116/1.4918716	journal	May 2015
A review of focused ion beam applications in microsystem technology Reyntjens, Steve; Puers, Robert Journal of Micromechanics and Microengineering, Vol. 11, Issue 4 https://doi.org/10.1088/0960-1317/11/4/301	journal	July 2001
Plasma source ion‐implantation technique for surface modification of materials Conrad, J. R.; Radtke, J. L.; Dodd, R. A. Journal of Applied Physics, Vol. 62, Issue 11 https://doi.org/10.1063/1.339055	journal	December 1987
Coincident ion acceleration and electron extraction for space propulsion using the self-bias formed on a set of RF biased grids bounding a plasma source Rafalskyi, D.; Aanesland, A. Journal of Physics D: Applied Physics, Vol. 47, Issue 49 https://doi.org/10.1088/0022-3727/47/49/495203	journal	November 2014
Physics of neutralization of intense high-energy ion beam pulses by electrons Kaganovich, I. D.; Davidson, R. C.; Dorf, M. A. Physics of Plasmas, Vol. 17, Issue 5 https://doi.org/10.1063/1.3335766	journal	May 2010
Sub-10 nm nanopantography Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul Applied Physics Letters, Vol. 107, Issue 19 https://doi.org/10.1063/1.4935552	journal	November 2015
Ion‐Beam Deposition of Thin Films of Diamondlike Carbon Aisenberg, Sol; Chabot, Ronald Journal of Applied Physics, Vol. 42, Issue 7 https://doi.org/10.1063/1.1660654	journal	June 1971
GaAs and AlGaAs anisotropic fine pattern etching using a new reactive ion beam etching system Asakawa, K. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 3, Issue 1 https://doi.org/10.1116/1.583273	journal	January 1985
Ion beam Lithography and Nanofabrication: a Review Watt, F.; Bettiol, A. A.; Van Kan, J. A. International Journal of Nanoscience, Vol. 04, Issue 03 https://doi.org/10.1142/S0219581X05003139	journal	June 2005
Extraction of a nearly monoenergetic ion beam using a pulsed plasma Xu, Lin; Economou, Demetre J.; Donnelly, Vincent M. Applied Physics Letters, Vol. 87, Issue 4 https://doi.org/10.1063/1.2001129	journal	July 2005
High homogeneity 25 cm low-energy rf ion source with inherent electron compensation Dudin, S. V.; Rafalskyi, D. V.; Zykov, A. V. Review of Scientific Instruments, Vol. 81, Issue 8 https://doi.org/10.1063/1.3477999	journal	August 2010
Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode Shin, Hyungjoo; Zhu, Weiye; Xu, Lin Plasma Sources Science and Technology, Vol. 20, Issue 5 https://doi.org/10.1088/0963-0252/20/5/055001	journal	August 2011
On the simultaneous extraction of positive ions and electrons from single-grid ICP source Dudin, S. V.; Rafalskyi, D. V. EPL (Europhysics Letters), Vol. 88, Issue 5 https://doi.org/10.1209/0295-5075/88/55002	journal	December 2009
Fast (tens to hundreds of eV) neutral beams for materials processing Economou, Demetre J. Journal of Physics D: Applied Physics, Vol. 41, Issue 2 https://doi.org/10.1088/0022-3727/41/2/024001	journal	January 2008
Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine Chang, Jane P.; Arnold, John C.; Zau, Gavin C. H. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 15, Issue 4 https://doi.org/10.1116/1.580652	journal	July 1997
Plasma molding over surface topography: Energy and angular distribution of ions extracted out of large holes Kim, Chang-Koo; Economou, Demetre J. Journal of Applied Physics, Vol. 91, Issue 5 https://doi.org/10.1063/1.1435423	journal	March 2002
Physics of ion beam plasma and problems of intensive ion beam transportation (invited) ^a) Soloshenko, I. A. Review of Scientific Instruments, Vol. 67, Issue 4 https://doi.org/10.1063/1.1146909	journal	April 1996
External control of electron energy distributions in a dual tandem inductively coupled plasma Liu, Lei; Sridhar, Shyam; Zhu, Weiye Journal of Applied Physics, Vol. 118, Issue 8 https://doi.org/10.1063/1.4928870	journal	August 2015
Use of ion beam assisted deposition to modify the microstructure and properties of thin films Smidt, F. A. International Materials Reviews, Vol. 35, Issue 1 https://doi.org/10.1179/095066090790323975	journal	January 1990

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