Filamentation of capacitively coupled plasmas in large magnetic fields

Menati, Mohamad; Thomas, Edward; Kushner, Mark J.

doi:10.1063/1.5092600

Title: Filamentation of capacitively coupled plasmas in large magnetic fields

Journal Article · 21 June 2019 · Physics of Plasmas

DOI: https://doi.org/10.1063/1.5092600 · OSTI ID:1610616

Menati, Mohamad ^[1]; Thomas, Edward ^[1];

^[2]

Auburn Univ., AL (United States)
Univ. of Michigan, Ann Arbor, MI (United States)

Over the last decade, dusty plasma research has sought to explore the physics of magnetized dusty plasmas. Due to the small charge-to-mass ratio of micron-sized dust grains, magnetic fields of B ≥ 1 T are needed to magnetize these particles. A peculiar phenomenon that occurs in capacitively coupled, glow discharge dusty plasmas at high magnetic fields that are perpendicular to the electrodes is the formation of stationary or mobile filamentary structures that are aligned along the magnetic field. In experiments, these filaments are found to form at a low neutral gas pressure, low applied radio frequency power, and a high magnetic field. This paper reports on new simulations of capacitively coupled plasmas at a high magnetic field for a configuration with a powered metal electrode and a grounded electrode with a dielectric barrier. It is shown that for this configuration, it is possible to form filamentary structures that appear in the electron density, potential, and light emission, which have properties that scale qualitatively with experiments. Finally, for these conditions, the dielectric strength of the boundary is most strongly correlated with the formation of the filaments. Implications of these observations and how they could be used to motivate future experiments are discussed.

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Research Organization:: Univ. of Michigan, Ann Arbor, MI (United States); Auburn Univ., AL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Fusion Energy Sciences (FES); National Science Foundation (NSF); USDOE

Grant/Contract Number:: SC0001939; SC0014132; SC0016330; PHY-1500126; PHY-1613087; PHY-112067

OSTI ID:: 1610616

Alternate ID(s):: OSTI ID: 1528675

Journal Information:: Physics of Plasmas, Vol. 26, Issue 6; ISSN 1070-664X

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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