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Title: Simulation Informed CAD for 3D Nanoprinting

Abstract

A promising 3D nanoprinting method, used to deposit nanoscale mesh style objects, is prone to non-linear distortions which limits the complexity and variety of deposit geometries. The method, focused electron beam-induced deposition (FEBID), uses a nanoscale electron probe for continuous dissociation of surface adsorbed precursor molecules which drives highly localized deposition. Three dimensional objects are deposited using a 2D digital scanning pattern—the digital beam speed controls deposition into the third, or out-of-plane dimension. Multiple computer-aided design (CAD) programs exist for FEBID mesh object definition but rely on the definition of nodes and interconnecting linear nanowires. Thus, a method is needed to prevent non-linear/bending nanowires for accurate geometric synthesis. An analytical model is derived based on simulation results, calibrated using real experiments, to ensure linear nanowire deposition to compensate for implicit beam heating that takes place during FEBID. The model subsequently compensates and informs the exposure file containing the pixel-by-pixel scanning instructions, ensuring nanowire linearity by appropriately adjusting the patterning beam speeds. The derivation of the model is presented, based on a critical mass balance revealed by simulations and the strategy used to integrate the physics-based analytical model into an existing 3D nanoprinting CAD program is overviewed.

Authors:
ORCiD logo [1]; ORCiD logo [2];  [3]; ORCiD logo [1]; ORCiD logo [4]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States)
  2. Graz Univ. of Technology (Austria)
  3. Univ. of Tennessee, Knoxville, TN (United States)
  4. Graz Univ. of Technology (Austria); Graz Centre for Electron Microscopy (Austria)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE; Christian Doppler Research Association (CDL-DEFINE); Austrian Cooperative Research (ACR); Austrian Federal Ministry for Digital and Economic Affairs and the National Foundation for Research Technology and Development
OSTI Identifier:
1606817
Grant/Contract Number:  
AC05-00OR22725; KC0403040 ERKCZ01; 11056459
Resource Type:
Accepted Manuscript
Journal Name:
Micromachines
Additional Journal Information:
Journal Volume: 11; Journal Issue: 1; Journal ID: ISSN 2072-666X
Publisher:
MDPI
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; focused electron beam induced deposition; 3D nanoprinting; additive nanomanufacturing

Citation Formats

Fowlkes, Jason Davidson, Winkler, Robert, Mutunga, Eva M., Rack, Philip D., and Plank, Harald. Simulation Informed CAD for 3D Nanoprinting. United States: N. p., 2019. Web. https://doi.org/10.3390/mi11010008.
Fowlkes, Jason Davidson, Winkler, Robert, Mutunga, Eva M., Rack, Philip D., & Plank, Harald. Simulation Informed CAD for 3D Nanoprinting. United States. https://doi.org/10.3390/mi11010008
Fowlkes, Jason Davidson, Winkler, Robert, Mutunga, Eva M., Rack, Philip D., and Plank, Harald. Wed . "Simulation Informed CAD for 3D Nanoprinting". United States. https://doi.org/10.3390/mi11010008. https://www.osti.gov/servlets/purl/1606817.
@article{osti_1606817,
title = {Simulation Informed CAD for 3D Nanoprinting},
author = {Fowlkes, Jason Davidson and Winkler, Robert and Mutunga, Eva M. and Rack, Philip D. and Plank, Harald},
abstractNote = {A promising 3D nanoprinting method, used to deposit nanoscale mesh style objects, is prone to non-linear distortions which limits the complexity and variety of deposit geometries. The method, focused electron beam-induced deposition (FEBID), uses a nanoscale electron probe for continuous dissociation of surface adsorbed precursor molecules which drives highly localized deposition. Three dimensional objects are deposited using a 2D digital scanning pattern—the digital beam speed controls deposition into the third, or out-of-plane dimension. Multiple computer-aided design (CAD) programs exist for FEBID mesh object definition but rely on the definition of nodes and interconnecting linear nanowires. Thus, a method is needed to prevent non-linear/bending nanowires for accurate geometric synthesis. An analytical model is derived based on simulation results, calibrated using real experiments, to ensure linear nanowire deposition to compensate for implicit beam heating that takes place during FEBID. The model subsequently compensates and informs the exposure file containing the pixel-by-pixel scanning instructions, ensuring nanowire linearity by appropriately adjusting the patterning beam speeds. The derivation of the model is presented, based on a critical mass balance revealed by simulations and the strategy used to integrate the physics-based analytical model into an existing 3D nanoprinting CAD program is overviewed.},
doi = {10.3390/mi11010008},
journal = {Micromachines},
number = 1,
volume = 11,
place = {United States},
year = {2019},
month = {12}
}

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    Works referencing / citing this record:

    Focused Electron Beam-Based 3D Nanoprinting for Scanning Probe Microscopy: A Review
    journal, December 2019

    • Plank, Harald; Winkler, Robert; Schwalb, Christian H.
    • Micromachines, Vol. 11, Issue 1
    • DOI: 10.3390/mi11010048