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Title: Water adsorption on vanadium oxide thin films in ambient relative humidity

Abstract

Here in this work, ambient pressure x-ray photoelectron spectroscopy (APXPS) is used to study the initial stages of water adsorption on vanadium oxide surfaces. V 2p, O 1s, C 1s, and valence band XPS spectra were collected as a function of relative humidity in a series of isotherm and isobar experiments. Experiments were carried out on two VO2 thin films on TiO2 (100) substrates, prepared with different surface cleaning procedures. Hydroxyl and molecular water surface species were identified, with up to 0.5 ML hydroxide present at the minimum relative humidity, and a consistent molecular water adsorption onset occurring around 0.01% relative humidity. The work function was found to increase with increasing relative humidity, suggesting that surface water and hydroxyl species are oriented with the hydrogen atoms directed away from the surface. Changes in the valence band were also observed as a function of relative humidity. The results were similar to those observed in APXPS experiments on other transition metal oxide surfaces, suggesting that H2O-OH and H2O-H2O surface complex formation plays an important role in the oxide wetting process and water dissociation. Compared to polycrystalline vanadium metal, these vanadium oxide films generate less hydroxide and appear to be more favorable formore » molecular water adsorption.« less

Authors:
ORCiD logo [1];  [2]; ORCiD logo [3];  [4]; ORCiD logo [5];  [6];  [7]; ORCiD logo [8]; ORCiD logo [9]; ORCiD logo [10]; ORCiD logo [11]
  1. Univ. of Auckland, Auckland (New Zealand); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS); MacDiarmid Inst. for Advanced Materials and Nanotechnology, Wellington (New Zealand)
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of Twente, Enschede (The Netherlands)
  5. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Lund Univ., Lund (Sweden)
  6. MacDiarmid Inst. for Advanced Materials and Nanotechnology, Wellington (New Zealand); National Isotope Center, GNS Science, Lower Hutt (New Zealand)
  7. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. College London, London (United Kingdom)
  8. Univ. of Virginia, Charlottesville, VA (United States); Chulalongkorn Univ., Bangkok (Thailand)
  9. Univ. of Auckland, Auckland (New Zealand); MacDiarmid Inst. for Advanced Materials and Nanotechnology, Wellington (New Zealand)
  10. Fritz Haber Inst. of the Max Planck Society, Berlin (Germany)
  11. Boston Univ., MA (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC); European Union (EU)
OSTI Identifier:
1605264
Grant/Contract Number:  
AC02-05CH11231; 705339; FG02-98ER45680
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Chemical Physics
Additional Journal Information:
Journal Volume: 152; Journal Issue: 4; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Goodacre, Dana, Blum, Monika, Buechner, Christin, Hoek, Harmen, Gericke, Sabrina M., Jovic, Vedran, Franklin, Joseph B., Kittiwatanakul, Salinporn, Söhnel, Tilo, Bluhm, Hendrik, and Smith, Kevin E. Water adsorption on vanadium oxide thin films in ambient relative humidity. United States: N. p., 2020. Web. doi:10.1063/1.5138959.
Goodacre, Dana, Blum, Monika, Buechner, Christin, Hoek, Harmen, Gericke, Sabrina M., Jovic, Vedran, Franklin, Joseph B., Kittiwatanakul, Salinporn, Söhnel, Tilo, Bluhm, Hendrik, & Smith, Kevin E. Water adsorption on vanadium oxide thin films in ambient relative humidity. United States. https://doi.org/10.1063/1.5138959
Goodacre, Dana, Blum, Monika, Buechner, Christin, Hoek, Harmen, Gericke, Sabrina M., Jovic, Vedran, Franklin, Joseph B., Kittiwatanakul, Salinporn, Söhnel, Tilo, Bluhm, Hendrik, and Smith, Kevin E. Fri . "Water adsorption on vanadium oxide thin films in ambient relative humidity". United States. https://doi.org/10.1063/1.5138959. https://www.osti.gov/servlets/purl/1605264.
@article{osti_1605264,
title = {Water adsorption on vanadium oxide thin films in ambient relative humidity},
author = {Goodacre, Dana and Blum, Monika and Buechner, Christin and Hoek, Harmen and Gericke, Sabrina M. and Jovic, Vedran and Franklin, Joseph B. and Kittiwatanakul, Salinporn and Söhnel, Tilo and Bluhm, Hendrik and Smith, Kevin E.},
abstractNote = {Here in this work, ambient pressure x-ray photoelectron spectroscopy (APXPS) is used to study the initial stages of water adsorption on vanadium oxide surfaces. V 2p, O 1s, C 1s, and valence band XPS spectra were collected as a function of relative humidity in a series of isotherm and isobar experiments. Experiments were carried out on two VO2 thin films on TiO2 (100) substrates, prepared with different surface cleaning procedures. Hydroxyl and molecular water surface species were identified, with up to 0.5 ML hydroxide present at the minimum relative humidity, and a consistent molecular water adsorption onset occurring around 0.01% relative humidity. The work function was found to increase with increasing relative humidity, suggesting that surface water and hydroxyl species are oriented with the hydrogen atoms directed away from the surface. Changes in the valence band were also observed as a function of relative humidity. The results were similar to those observed in APXPS experiments on other transition metal oxide surfaces, suggesting that H2O-OH and H2O-H2O surface complex formation plays an important role in the oxide wetting process and water dissociation. Compared to polycrystalline vanadium metal, these vanadium oxide films generate less hydroxide and appear to be more favorable for molecular water adsorption.},
doi = {10.1063/1.5138959},
journal = {Journal of Chemical Physics},
number = 4,
volume = 152,
place = {United States},
year = {Fri Jan 31 00:00:00 EST 2020},
month = {Fri Jan 31 00:00:00 EST 2020}
}

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