Dual‐Scale Nanostructures via Evaporative Assembly

Srivastava, Sunita; Wahith, Zaibudeen A.; Gang, Oleg; Colosqui, Carlos E.; Bhatia, Surita R.

doi:10.1002/admi.201901954

Title: Dual‐Scale Nanostructures via Evaporative Assembly

Journal Article · 28 February 2020 · Advanced Materials Interfaces

DOI: https://doi.org/10.1002/admi.201901954 · OSTI ID:1602086

^[1]; Wahith, Zaibudeen A. ^[1];

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Department of Physics Indian Institute of Technology Bombay Mumbai 400076 India
Center for Functional Nanomaterials Brookhaven National Laboratory Upton NY 11973 USA, Department of Chemical Engineering Columbia University New York NY 10027 USA, Department of Applied Physics and Applied Mathematics Columbia University New York NY 10027 USA
Department of Mechanical Engineering Stony Brook University Stony Brook NY 11794 USA
Department of Chemistry Stony Brook University Stony Brook NY 11794 USA

Abstract Dual‐scale hierarchical structures with regular microscale patterns and varying degree of nanoscale crystalline order are synthesized on physically and chemically homogeneous substrates by evaporative self‐assembly with a suspension of DNA‐functionalized nanoparticles (NPs) with a charged core shell. For a certain NP concentration range, periodic concentric rings in a stripe‐like micropattern are produced over macroscale surface areas by an NP monolayer with hexagonal lattice structure at the nanoscale. The stripe width, spacing, and nanoparticle ordering can be controlled by varying the NP concentration. The results indicate that the interplay between “stick‐slip” motion of the droplet contact line and coulombic and steric NP interactions control the formation of the observed structures. A simple analytical model is proposed to account for the experimental observations and guide the future design of different nanostructure morphologies. This work demonstrates a simple cost‐effective mask‐free method for fabricating large‐area nanostructured 2D materials and metasurfaces for applications ranging from energy conversion/storage to optoelectronics and nanophotonics.

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Sponsoring Organization:: USDOE

OSTI ID:: 1602086

Journal Information:: Advanced Materials Interfaces, Journal Name: Advanced Materials Interfaces Vol. 7 Journal Issue: 7; ISSN 2196-7350

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: Germany

Language:: English

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Cited by: 13 works

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