Multi-layering of SU-8 exhibits distinct geometrical transitions from circular to planarized profiles
The negative tone photoresist SU-8 permits the creation of micrometer-scale structures by optical lithography. It is also the most used photoresist in soft lithography for the fast-prototyping of microfluidic devices. Despite its importance, the effect of capillary forces on SU-8 multi-layering onto topographical features has not been thoroughly studied. In particular, the profile of the added layer has not been examined in detail. The overlaying process exhibits a set of distinct behaviors, or regimes, depending on the relative thickness of the overlay and the underlying rectangular pattern. We demonstrate how capillary effects control the profile of multi-layer microchannels in a predictable manner. We derive a simple static model to describe the evolution of the overlay as a function of dimensionless geometric parameters. Our study provides a critical understanding of the parameters that govern multi-layer spin coating.
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1601032
- Journal Information:
- Biomicrofluidics, Journal Name: Biomicrofluidics Journal Issue: 1 Vol. 14; ISSN 1932-1058
- Publisher:
- American Institute of PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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