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Title: Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization

Authors:
 [1];  [2];  [3];  [4];  [4];  [5];  [6];  [7]; ORCiD logo [4]
  1. Chemical Sciences and Engineering DivisionArgonne National Laboratory Lemont IL 60439 USA, MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and StorageState Key Laboratory of Urban Water Resource and EnvironmentSchool of Chemistry and Chemical EngineeringHarbin Institute of Technology Harbin 150001 P. R. China, Advanced Materials for Energy‐Water Systems Energy Frontier Research CenterArgonne National Laboratory Lemont IL 60439 USA
  2. Pritzker School of Molecular EngineeringUniversity of Chicago Chicago IL 60637 USA, Center for Advanced Radiation Source (ChemMatCARS)University of Chicago Chicago IL 60637 USA
  3. Chemical Sciences and Engineering DivisionArgonne National Laboratory Lemont IL 60439 USA, Advanced Materials for Energy‐Water Systems Energy Frontier Research CenterArgonne National Laboratory Lemont IL 60439 USA
  4. Chemical Sciences and Engineering DivisionArgonne National Laboratory Lemont IL 60439 USA, Advanced Materials for Energy‐Water Systems Energy Frontier Research CenterArgonne National Laboratory Lemont IL 60439 USA, Pritzker School of Molecular EngineeringUniversity of Chicago Chicago IL 60637 USA
  5. Applied Materials DivisionArgonne National Laboratory Lemont IL 60439 USA
  6. Advanced Materials for Energy‐Water Systems Energy Frontier Research CenterArgonne National Laboratory Lemont IL 60439 USA, Applied Materials DivisionArgonne National Laboratory Lemont IL 60439 USA
  7. MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and StorageState Key Laboratory of Urban Water Resource and EnvironmentSchool of Chemistry and Chemical EngineeringHarbin Institute of Technology Harbin 150001 P. R. China
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1599926
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Name: Advanced Functional Materials; Journal ID: ISSN 1616-301X
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Yang, Xiaobin, Sun, Pan, Zhang, Huiru, Xia, Zijing, Waldman, Ruben Z., Mane, Anil U., Elam, Jeffrey W., Shao, Lu, and Darling, Seth B. Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization. Germany: N. p., 2020. Web. doi:10.1002/adfm.201910062.
Yang, Xiaobin, Sun, Pan, Zhang, Huiru, Xia, Zijing, Waldman, Ruben Z., Mane, Anil U., Elam, Jeffrey W., Shao, Lu, & Darling, Seth B. Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization. Germany. doi:10.1002/adfm.201910062.
Yang, Xiaobin, Sun, Pan, Zhang, Huiru, Xia, Zijing, Waldman, Ruben Z., Mane, Anil U., Elam, Jeffrey W., Shao, Lu, and Darling, Seth B. Sun . "Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization". Germany. doi:10.1002/adfm.201910062.
@article{osti_1599926,
title = {Polyphenol‐Sensitized Atomic Layer Deposition for Membrane Interface Hydrophilization},
author = {Yang, Xiaobin and Sun, Pan and Zhang, Huiru and Xia, Zijing and Waldman, Ruben Z. and Mane, Anil U. and Elam, Jeffrey W. and Shao, Lu and Darling, Seth B.},
abstractNote = {},
doi = {10.1002/adfm.201910062},
journal = {Advanced Functional Materials},
number = ,
volume = ,
place = {Germany},
year = {2020},
month = {2}
}

Journal Article:
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