skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

This content will become publicly available on February 12, 2021

Title: Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1598749
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Optics
Additional Journal Information:
Journal Name: Applied Optics Journal Volume: 59 Journal Issue: 6; Journal ID: ISSN 1559-128X
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English

Citation Formats

Suratwala, T., Steele, R., Destino, J., Wong, L., Norton, M., Laurence, T., Aracne-Ruddle, C., Miller, P., Shen, N., Feit, M., Ray, N., Carr, W., Rivers, C., Peters, V., Jeppson, S., Malone, D., and Greene, W. Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength. United States: N. p., 2020. Web. doi:10.1364/AO.381739.
Suratwala, T., Steele, R., Destino, J., Wong, L., Norton, M., Laurence, T., Aracne-Ruddle, C., Miller, P., Shen, N., Feit, M., Ray, N., Carr, W., Rivers, C., Peters, V., Jeppson, S., Malone, D., & Greene, W. Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength. United States. doi:10.1364/AO.381739.
Suratwala, T., Steele, R., Destino, J., Wong, L., Norton, M., Laurence, T., Aracne-Ruddle, C., Miller, P., Shen, N., Feit, M., Ray, N., Carr, W., Rivers, C., Peters, V., Jeppson, S., Malone, D., and Greene, W. Wed . "Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength". United States. doi:10.1364/AO.381739.
@article{osti_1598749,
title = {Sapphire advanced mitigation process: wet etch to expose sub-surface damage and increase laser damage resistance and mechanical strength},
author = {Suratwala, T. and Steele, R. and Destino, J. and Wong, L. and Norton, M. and Laurence, T. and Aracne-Ruddle, C. and Miller, P. and Shen, N. and Feit, M. and Ray, N. and Carr, W. and Rivers, C. and Peters, V. and Jeppson, S. and Malone, D. and Greene, W.},
abstractNote = {},
doi = {10.1364/AO.381739},
journal = {Applied Optics},
number = 6,
volume = 59,
place = {United States},
year = {2020},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on February 12, 2021
Publisher's Version of Record

Save / Share:

Works referenced in this record:

The Chemical Polishing of Sapphire and MgAl Spinel
journal, January 1971

  • Reisman, A.; Berkenblit, M.; Cuomo, J.
  • Journal of The Electrochemical Society, Vol. 118, Issue 10
  • DOI: 10.1149/1.2407804

Laser surface and subsurface modification of sapphire using femtosecond pulses
journal, August 2016


MRF applications: measurement of process-dependent subsurface damage in optical materials using the MRF wedge technique
conference, December 2005

  • Menapace, Joseph A.; Davis, Pete J.; Steele, William A.
  • Boulder Damage Symposium XXXVII: Annual Symposium on Optical Materials for High Power Lasers, SPIE Proceedings
  • DOI: 10.1117/12.638839

Zeta Potential Orientation Dependence of Sapphire Substrates
journal, May 2004

  • Kershner, Ryan J.; Bullard, Joseph W.; Cima, Michael J.
  • Langmuir, Vol. 20, Issue 10
  • DOI: 10.1021/la036268w

Characteristics and kinetics of laser-pumped Ti:sapphire oscillators
journal, June 1988

  • Eggleston, J. M.; DeShazer, L. G.; Kangas, K. W.
  • IEEE Journal of Quantum Electronics, Vol. 24, Issue 6
  • DOI: 10.1109/3.222

Rapid growth of KDP-type crystals
journal, January 2001


The Chemical Polishing and Etch Pitting of Sapphire
journal, January 1971

  • Vardiman, R. G.
  • Journal of The Electrochemical Society, Vol. 118, Issue 11
  • DOI: 10.1149/1.2407840

Metallic-like photoluminescence and absorption in fused silica surface flaws
journal, April 2009

  • Laurence, Ted A.; Bude, Jeff D.; Shen, Nan
  • Applied Physics Letters, Vol. 94, Issue 15
  • DOI: 10.1063/1.3119622

Wet KOH etching of freestanding AlN single crystals
journal, March 2007


Brittle-Ductile Transition and Dislocation Mobility in Sapphire
journal, December 1994


High fluence laser damage precursors and their mitigation in fused silica
journal, January 2014


HF-Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces: HF-Based Etching Processes for Improving Laser Damage Resistance
journal, October 2010


A large-aperture high-energy laser system for optics and optical component testing
conference, June 2004

  • Nostrand, Mike C.; Weiland, Timothy L.; Luthi, Ronald L.
  • XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, SPIE Proceedings
  • DOI: 10.1117/12.528327

Towards predicting removal rate and surface roughness during grinding of optical materials
journal, January 2019

  • Suratwala, Tayyab; Steele, Rusty; Wong, Lana
  • Applied Optics, Vol. 58, Issue 10
  • DOI: 10.1364/AO.58.002490

Recent advances in defect-selective etching of GaN
journal, March 2000


The effect of HF/NH4F etching on the morphology of surface fractures on fused silica
journal, May 2009


Optical resistance of sapphire
journal, February 1993

  • Chmel, A.; Eronko, S. B.; Kondyrev, A. M.
  • Journal of Materials Science, Vol. 28, Issue 17
  • DOI: 10.1007/BF00414257

Importance of surface topography on pulsed laser-induced damage threshold of Sapphire crystals
journal, April 2017


The effect of crystal orientation on the cryogenic strength of hydroxide catalysis bonded sapphire
journal, March 2015


Techniques for qualitative and quantitative measurement of aspects of laser-induced damage important for laser beam propagation
journal, June 2006


Strengthening Sapphire by Compressive Surface Layers
journal, August 1969

  • Kirchner, H. P.; Gruver, R. M.; Walker, R. E.
  • Journal of Applied Physics, Vol. 40, Issue 9
  • DOI: 10.1063/1.1658217

Laser processing of sapphire with picosecond and sub-picosecond pulses
journal, November 1997


Study on Sapphire Surface Preparation for III-Nitride Heteroepitaxial Growth by Chemical Treatments
journal, January 2002

  • Dwikusuma, F.; Saulys, D.; Kuech, T. F.
  • Journal of The Electrochemical Society, Vol. 149, Issue 11
  • DOI: 10.1149/1.1509072

Advanced technologies of shaped sapphire fabrication
journal, April 2008


High-Average-Power Ultrafast Lasers
journal, January 2017


Quasi-continuum photoluminescence: Unusual broad spectral and temporal characteristics found in defective surfaces of silica and other materials
journal, February 2014

  • Laurence, Ted A.; Bude, Jeff D.; Shen, Nan
  • Journal of Applied Physics, Vol. 115, Issue 8
  • DOI: 10.1063/1.4866422

Mechanical strength of sapphire windows under pressure
journal, August 1994

  • Chervin, J. C.; Syfosse, G.; Besson, J. M.
  • Review of Scientific Instruments, Vol. 65, Issue 8
  • DOI: 10.1063/1.1145206

The suitability of sapphire for laser windows
journal, January 1999


Chemical mechanical polishing (CMP) anisotropy in sapphire
journal, September 2004


Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces
journal, January 2010

  • Miller, P. E.; Bude, J. D.; Suratwala, T. I.
  • Optics Letters, Vol. 35, Issue 16
  • DOI: 10.1364/OL.35.002702

High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas
journal, May 2001


Laser sputtering. Part II. The mechanism of the sputtering of Al2O3
journal, February 1984

  • Rothenberg, Joshua E.; Kelly, Roger
  • Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 1, Issue 2-3
  • DOI: 10.1016/0168-583X(84)90083-1

Ball-on-Ring Test Revisited
journal, August 1989


Low temperature wet etching to reveal sub-surface damage in sapphire substrates
journal, May 2013


Anisotropic Etching of SiC
journal, January 2000

  • Syväjärvi, M.; Yakimova, R.; Janzén, E.
  • Journal of The Electrochemical Society, Vol. 147, Issue 9
  • DOI: 10.1149/1.1393930

Improving sapphire window strength
conference, June 1997

  • Borden, Michael R.; Askinazi, Joel
  • AeroSense '97, SPIE Proceedings
  • DOI: 10.1117/12.277049

Current status of sapphire dome production
conference, September 1994

  • Schmid, Frederick; Smith, Maynard B.; Khattak, Chandra P.
  • SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, SPIE Proceedings
  • DOI: 10.1117/12.187329