Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

Chang, Chun-Chieh; Nogan, John; Yang, Zu-Po; de Melo Kort-Kamp, Wilton Junior; Ross, Willard; Luk, Ting S.; Dalvit, Diego Alejandro Roberto; Azad, Abul Kalam; Chen, Houtong

doi:10.1038/s41598-019-51236-3

Title: Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

Journal Article · 25 October 2019 · Scientific Reports

DOI: https://doi.org/10.1038/s41598-019-51236-3 · OSTI ID:1597357

Chang, Chun-Chieh ^[1]; Nogan, John ^[2]; Yang, Zu-Po ^[3];

^[4]; Ross, Willard ^[2]; Luk, Ting S. ^[2];

^[4];

^[5];

^[5]

Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT); National Taiwan Normal Univ., Taipei (Taiwan)
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies
National Chiao Tung Univ., Tainan (Taiwan). Inst. of Photonic System
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT)

Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential applications and prevented its integration into existing CMOS device architectures. Here, we demonstrate highly plasmonic TiN thin films and nanostructures by a room-temperature, low-power, and bias-free reactive sputtering process. We investigate the optical properties of the TiN films and their dependence on the sputtering conditions and substrate materials. We find that our TiN possesses one of the largest negative values of the real part of the dielectric function as compared to all other plasmonic TiN films reported to date. Two-dimensional periodic arrays of TiN nanodisks are then fabricated, from which we validate that strong plasmonic resonances are supported. Our room-temperature deposition process can allow for fabricating complex plasmonic TiN nanostructures and be integrated into the fabrication of existing CMOS-based photonic devices to enhance their performance and functionalities.

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Research Organization:: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)

Sponsoring Organization:: USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division; USDOE National Nuclear Security Administration (NNSA); Ministry of Science and Technology of Taiwan (MOST)

Grant/Contract Number:: 89233218CNA000001; AC52-06NA25396; MOST-106-2221-E-009-122-MY3

OSTI ID:: 1597357

Report Number(s):: LA-UR-19-29707

Journal Information:: Scientific Reports, Vol. 9, Issue 1; ISSN 2045-2322

Publisher:: Nature Publishing GroupCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 53 works

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Quantifying Figures of Merit for Localized Surface Plasmon Resonance Applications: A Materials Survey Doiron, Brock; Mota, Mónica; Wells, Matthew P. ACS Photonics, Vol. 6, Issue 2 https://doi.org/10.1021/acsphotonics.8b01369	journal	January 2019
Local Heating with Lithographically Fabricated Plasmonic Titanium Nitride Nanoparticles Guler, Urcan; Ndukaife, Justus C.; Naik, Gururaj V. Nano Letters, Vol. 13, Issue 12 https://doi.org/10.1021/nl4033457	journal	November 2013
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Optical properties of TiN films deposited by direct current reactive sputtering Adachi, Sadao; Takahashi, Mitsutoshi Journal of Applied Physics, Vol. 87, Issue 3 https://doi.org/10.1063/1.372006	journal	February 2000
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Fully CMOS-compatible titanium nitride nanoantennas Briggs, Justin A.; Naik, Gururaj V.; Petach, Trevor A. Applied Physics Letters, Vol. 108, Issue 5 https://doi.org/10.1063/1.4941413	journal	February 2016
Plasma assisted physical vapor deposition processes: A review Bunshah, R. F.; Deshpandey, C. V. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 3, Issue 3 https://doi.org/10.1116/1.572993	journal	May 1985
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Optical Properties and Plasmonic Performance of Titanium Nitride Patsalas, Panos; Kalfagiannis, Nikolaos; Kassavetis, Spyros Materials, Vol. 8, Issue 6 https://doi.org/10.3390/ma8063128	journal	May 2015
Examining the performance of refractory conductive ceramics as plasmonic materials: a theoretical approach Kumar, Mukesh; Umezawa, Naoto; Ishii, Satoshi arXiv https://doi.org/10.48550/arxiv.1510.04760	text	January 2015
Temperature-dependent optical properties of plasmonic titanium nitride thin films Reddy, Harsha; Guler, Urcan; Kudyshev, Zhaxylyk arXiv https://doi.org/10.48550/arxiv.1702.03053	preprint	January 2017
Plasmonic properties of refractory titanium nitride Catellani, Alessandra; Calzolari, Arrigo arXiv https://doi.org/10.48550/arxiv.1702.04990	text	January 2017
Controlling the plasmonic properties of ultrathin TiN films at the atomic level Shah, Deesha; Catellani, Alessandra; Reddy, Harsha arXiv https://doi.org/10.48550/arxiv.1712.06142	preprint	January 2017

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Title: Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

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