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Title: The Synthesis Science of Targeted Vapor-Phase Metal–Organic Framework Postmodification

Abstract

The postmodification of metal organic frameworks (MOFs) affords exceedingly high surface area materials with precisely installed chemical features, which provide new opportunities for detailed structure function correlation in the field of catalysis. Here, we significantly expand upon the number of vapor-phase postmodification processes reported to date through screening a library of atomic layer deposition (ALD) precursors, which span metals across the periodic table and which include ligands from four distinct precursor classes. Furthermore, with a large library of precursors and synthesis conditions, we discern trends in the compatibility of precursor classes for well-behaved ALD in MOFs (AIM) and identify challenges and solutions to more precise postsynthetic modification.

Authors:
 [1]; ORCiD logo [2];  [3]; ORCiD logo [4]; ORCiD logo [5]; ORCiD logo [6]; ORCiD logo [4]; ORCiD logo [3]; ORCiD logo [3]; ORCiD logo [3]; ORCiD logo [7]
  1. Argonne National Lab. (ANL), Lemont, IL (United States); Korea Inst. of Science and Technology (KIST), Seoul (Korea)
  2. Northwestern Univ., Evanston, IL (United States); Univ. of California, Berkeley, CA (United States)
  3. Northwestern Univ., Evanston, IL (United States)
  4. Univ. of Minnesota, Minneapolis, MN (United States)
  5. Argonne National Lab. (ANL), Argonne, IL (United States)
  6. Argonne National Lab. (ANL), Argonne, IL (United States); Stony Brook Univ., NY (United States)
  7. Argonne National Lab. (ANL), Lemont, IL (United States)
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Energy Frontier Research Center for Inorganometallic Catalyst Design (ICDC); Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1595952
Grant/Contract Number:  
AC02-06CH11357; SC0012702
Resource Type:
Accepted Manuscript
Journal Name:
Journal of the American Chemical Society
Additional Journal Information:
Journal Volume: 142; Journal Issue: 1; Journal ID: ISSN 0002-7863
Publisher:
American Chemical Society (ACS)
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; oxides; metals; precursors; metal organic frameworks; atomic layer deposition; vapor phase; functionalization; post-synthetic modification

Citation Formats

Kim, In Soo, Ahn, Sol, Vermeulen, Nicolaas A., Webber, Thomas E., Gallington, Leighanne C., Chapman, Karena W., Penn, R. Lee, Hupp, Joseph T., Farha, Omar K., Notestein, Justin M., and Martinson, Alex B. F. The Synthesis Science of Targeted Vapor-Phase Metal–Organic Framework Postmodification. United States: N. p., 2019. Web. https://doi.org/10.1021/jacs.9b10034.
Kim, In Soo, Ahn, Sol, Vermeulen, Nicolaas A., Webber, Thomas E., Gallington, Leighanne C., Chapman, Karena W., Penn, R. Lee, Hupp, Joseph T., Farha, Omar K., Notestein, Justin M., & Martinson, Alex B. F. The Synthesis Science of Targeted Vapor-Phase Metal–Organic Framework Postmodification. United States. https://doi.org/10.1021/jacs.9b10034
Kim, In Soo, Ahn, Sol, Vermeulen, Nicolaas A., Webber, Thomas E., Gallington, Leighanne C., Chapman, Karena W., Penn, R. Lee, Hupp, Joseph T., Farha, Omar K., Notestein, Justin M., and Martinson, Alex B. F. Wed . "The Synthesis Science of Targeted Vapor-Phase Metal–Organic Framework Postmodification". United States. https://doi.org/10.1021/jacs.9b10034. https://www.osti.gov/servlets/purl/1595952.
@article{osti_1595952,
title = {The Synthesis Science of Targeted Vapor-Phase Metal–Organic Framework Postmodification},
author = {Kim, In Soo and Ahn, Sol and Vermeulen, Nicolaas A. and Webber, Thomas E. and Gallington, Leighanne C. and Chapman, Karena W. and Penn, R. Lee and Hupp, Joseph T. and Farha, Omar K. and Notestein, Justin M. and Martinson, Alex B. F.},
abstractNote = {The postmodification of metal organic frameworks (MOFs) affords exceedingly high surface area materials with precisely installed chemical features, which provide new opportunities for detailed structure function correlation in the field of catalysis. Here, we significantly expand upon the number of vapor-phase postmodification processes reported to date through screening a library of atomic layer deposition (ALD) precursors, which span metals across the periodic table and which include ligands from four distinct precursor classes. Furthermore, with a large library of precursors and synthesis conditions, we discern trends in the compatibility of precursor classes for well-behaved ALD in MOFs (AIM) and identify challenges and solutions to more precise postsynthetic modification.},
doi = {10.1021/jacs.9b10034},
journal = {Journal of the American Chemical Society},
number = 1,
volume = 142,
place = {United States},
year = {2019},
month = {12}
}

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