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Title: Photothermally Directed Assembly of Block Copolymers


Block copolymers self-assemble into nanoscale morphologies, spontaneously ordering under thermal annealing conditions owing to the chemical incompatibility between the blocks. Although the morphologies that form can be rationalized based on equilibrium arguments, the structures seen experimentally are strongly influenced by kinetic effects including process history. Recently, a variety of photothermal processing techniques have been used to control block copolymer ordering. Photothermal methods provide access to extreme conditions, including high temperatures, large heating rates, and sharp thermal gradients. Furthermore, this can be used to greatly accelerate block copolymer ordering kinetics, to pattern material order, or to probe fundamental aspects of self-assembly by exploring process histories.

 [1]; ORCiD logo [1]
  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
Publication Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
Report Number(s):
Journal ID: ISSN 2196-7350
Grant/Contract Number:  
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Materials Interfaces
Additional Journal Information:
Journal Volume: 7; Journal Issue: 5; Journal ID: ISSN 2196-7350
Country of Publication:
United States
77 NANOSCIENCE AND NANOTECHNOLOGY; block copolymers; directed self-assembly; laser zone annealing; photothermal annealing

Citation Formats

Nowak, Samantha R., and Yager, Kevin G. Photothermally Directed Assembly of Block Copolymers. United States: N. p., 2019. Web. doi:10.1002/admi.201901679.
Nowak, Samantha R., & Yager, Kevin G. Photothermally Directed Assembly of Block Copolymers. United States.
Nowak, Samantha R., and Yager, Kevin G. Fri . "Photothermally Directed Assembly of Block Copolymers". United States.
title = {Photothermally Directed Assembly of Block Copolymers},
author = {Nowak, Samantha R. and Yager, Kevin G.},
abstractNote = {Block copolymers self-assemble into nanoscale morphologies, spontaneously ordering under thermal annealing conditions owing to the chemical incompatibility between the blocks. Although the morphologies that form can be rationalized based on equilibrium arguments, the structures seen experimentally are strongly influenced by kinetic effects including process history. Recently, a variety of photothermal processing techniques have been used to control block copolymer ordering. Photothermal methods provide access to extreme conditions, including high temperatures, large heating rates, and sharp thermal gradients. Furthermore, this can be used to greatly accelerate block copolymer ordering kinetics, to pattern material order, or to probe fundamental aspects of self-assembly by exploring process histories.},
doi = {10.1002/admi.201901679},
journal = {Advanced Materials Interfaces},
number = 5,
volume = 7,
place = {United States},
year = {2019},
month = {12}

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