Control of passivation and compensation in Mg-doped GaN by defect quasi Fermi level control
Abstract
A defect quasi Fermi level (dQFL) control process based on above bandgap illumination was applied to control H and VN-complexes, which are the main contributors to the passivation and self-compensation, respectively, in Mg:GaN grown via metalorganic chemical vapor deposition. Secondary ion mass spectrometry measurements confirmed that the total Mg incorporation was unaffected by the process. However, the total H concentration was reduced to similar levels obtained by post-growth thermal activation prior to any annealing treatment. Similarly, the 2.8 eV emission in the photoluminescence spectra, attributed to compensating VN and its complexes, was reduced for the dQFL-process samples. After thermal activation and Ni/Au contact deposition, Hall effect measurements revealed lower resistivities (increased mobilities and free hole concentrations) for dQFL-grown samples with Mg doping concentrations above and below 2 × 1019 cm-3. All these results demonstrate that the dQFL process can effectively reduce the H-passivation and self-compensation of the Mg:GaN films.
- Authors:
-
- North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering
- Adroit Materials, Inc., Cary, NC (United States)
- North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering; Adroit Materials, Inc., Cary, NC (United States)
- Publication Date:
- Research Org.:
- HexaTech, Raleigh, NC (United States); Adroit Materials, Cary, NC (United States)
- Sponsoring Org.:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E); USDOE Office of Science (SC), Engineering & Technology. Office of Small Business Innovation Research (SBIR) and Small Business Technology Transfer (STTR) Programs
- OSTI Identifier:
- 1798992
- Alternate Identifier(s):
- OSTI ID: 1593195
- Grant/Contract Number:
- AR0000299; SC0011883
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 127; Journal Issue: 4; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Klump, A., Hoffmann, M. P., Kaess, F., Tweedie, J., Reddy, P., Kirste, R., Sitar, Z., and Collazo, R. Control of passivation and compensation in Mg-doped GaN by defect quasi Fermi level control. United States: N. p., 2020.
Web. doi:10.1063/1.5126004.
Klump, A., Hoffmann, M. P., Kaess, F., Tweedie, J., Reddy, P., Kirste, R., Sitar, Z., & Collazo, R. Control of passivation and compensation in Mg-doped GaN by defect quasi Fermi level control. United States. https://doi.org/10.1063/1.5126004
Klump, A., Hoffmann, M. P., Kaess, F., Tweedie, J., Reddy, P., Kirste, R., Sitar, Z., and Collazo, R. Wed .
"Control of passivation and compensation in Mg-doped GaN by defect quasi Fermi level control". United States. https://doi.org/10.1063/1.5126004. https://www.osti.gov/servlets/purl/1798992.
@article{osti_1798992,
title = {Control of passivation and compensation in Mg-doped GaN by defect quasi Fermi level control},
author = {Klump, A. and Hoffmann, M. P. and Kaess, F. and Tweedie, J. and Reddy, P. and Kirste, R. and Sitar, Z. and Collazo, R.},
abstractNote = {A defect quasi Fermi level (dQFL) control process based on above bandgap illumination was applied to control H and VN-complexes, which are the main contributors to the passivation and self-compensation, respectively, in Mg:GaN grown via metalorganic chemical vapor deposition. Secondary ion mass spectrometry measurements confirmed that the total Mg incorporation was unaffected by the process. However, the total H concentration was reduced to similar levels obtained by post-growth thermal activation prior to any annealing treatment. Similarly, the 2.8 eV emission in the photoluminescence spectra, attributed to compensating VN and its complexes, was reduced for the dQFL-process samples. After thermal activation and Ni/Au contact deposition, Hall effect measurements revealed lower resistivities (increased mobilities and free hole concentrations) for dQFL-grown samples with Mg doping concentrations above and below 2 × 1019 cm-3. All these results demonstrate that the dQFL process can effectively reduce the H-passivation and self-compensation of the Mg:GaN films.},
doi = {10.1063/1.5126004},
journal = {Journal of Applied Physics},
number = 4,
volume = 127,
place = {United States},
year = {Wed Jan 22 00:00:00 EST 2020},
month = {Wed Jan 22 00:00:00 EST 2020}
}
Web of Science
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