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Title: Understanding chemical and physical mechanisms in atomic layer deposition

Authors:
ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1]
  1. Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1593180
Grant/Contract Number:  
SC0004782
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Chemical Physics
Additional Journal Information:
Journal Name: Journal of Chemical Physics Journal Volume: 152 Journal Issue: 4; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Richey, Nathaniel E., de Paula, Camila, and Bent, Stacey F. Understanding chemical and physical mechanisms in atomic layer deposition. United States: N. p., 2020. Web. doi:10.1063/1.5133390.
Richey, Nathaniel E., de Paula, Camila, & Bent, Stacey F. Understanding chemical and physical mechanisms in atomic layer deposition. United States. doi:10.1063/1.5133390.
Richey, Nathaniel E., de Paula, Camila, and Bent, Stacey F. Fri . "Understanding chemical and physical mechanisms in atomic layer deposition". United States. doi:10.1063/1.5133390.
@article{osti_1593180,
title = {Understanding chemical and physical mechanisms in atomic layer deposition},
author = {Richey, Nathaniel E. and de Paula, Camila and Bent, Stacey F.},
abstractNote = {},
doi = {10.1063/1.5133390},
journal = {Journal of Chemical Physics},
number = 4,
volume = 152,
place = {United States},
year = {2020},
month = {1}
}

Journal Article:
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journal, January 2013

  • Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko
  • Journal of Applied Physics, Vol. 113, Issue 2, Article No. 021301
  • DOI: 10.1063/1.4757907

Nanoparticle sintering in atomic layer deposition of supported catalysts: Kinetic modeling of the size distribution
journal, October 2018


Area-Selective Atomic Layer Deposition of SiO 2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
journal, September 2017


The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces
journal, February 2018


Sonication-induced Ostwald ripening of ZIF-8 nanoparticles and formation of ZIF-8/polymer composite membranes
journal, August 2012


A brief review of atomic layer deposition: from fundamentals to applications
journal, June 2014


Revisiting the growth mechanism of atomic layer deposition of Al 2 O 3 : A vibrational sum-frequency generation study
journal, September 2017

  • Vandalon, Vincent; Kessels, W. M. M. (Erwin)
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 5
  • DOI: 10.1116/1.4993597

Review Article: Catalysts design and synthesis via selective atomic layer deposition
journal, January 2018

  • Cao, Kun; Cai, Jiaming; Liu, Xiao
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 36, Issue 1
  • DOI: 10.1116/1.5000587

Reactivity and sintering kinetics of Au/TiO2(110) model catalysts: particle size effects
journal, June 2007


Manganese(ii): the black sheep of the organometallic family
journal, January 2008

  • Layfield, Richard A.
  • Chemical Society Reviews, Vol. 37, Issue 6
  • DOI: 10.1039/b708850g

The Effect of Size-Dependent Nanoparticle Energetics on Catalyst Sintering
journal, October 2002


Homoepitaxial Ostwald ripening
journal, June 2003


AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing
journal, March 2006

  • Schumacher, M.; Baumann, P. K.; Seidel, T.
  • Chemical Vapor Deposition, Vol. 12, Issue 2-3
  • DOI: 10.1002/cvde.200500027

Island growth as a growth mode in atomic layer deposition: A phenomenological model
journal, December 2004

  • Puurunen, Riikka L.; Vandervorst, Wilfried
  • Journal of Applied Physics, Vol. 96, Issue 12
  • DOI: 10.1063/1.1810193

Ceria Maintains Smaller Metal Catalyst Particles by Strong Metal-Support Bonding
journal, August 2010


Probing Allostery Through DNA
journal, February 2013