High energy product of MnBi by field annealing and Sn alloying
- Authors:
-
- Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA, Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, USA
- Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA, Department of Physics, South Dakota State University, Brookings, South Dakota 57007, USA
- Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1580168
- Grant/Contract Number:
- FG02-04ER46152
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- APL Materials
- Additional Journal Information:
- Journal Name: APL Materials Journal Volume: 7 Journal Issue: 12; Journal ID: ISSN 2166-532X
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, and Sellmyer, David J. High energy product of MnBi by field annealing and Sn alloying. United States: N. p., 2019.
Web. doi:10.1063/1.5128659.
Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, & Sellmyer, David J. High energy product of MnBi by field annealing and Sn alloying. United States. doi:https://doi.org/10.1063/1.5128659
Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, and Sellmyer, David J. Sun .
"High energy product of MnBi by field annealing and Sn alloying". United States. doi:https://doi.org/10.1063/1.5128659.
@article{osti_1580168,
title = {High energy product of MnBi by field annealing and Sn alloying},
author = {Zhang, Wenyong and Balasubramanian, Balamurugan and Kharel, Parashu and Pahari, Rabindra and Valloppilly, Shah R. and Li, Xingzhong and Yue, Lanping and Skomski, Ralph and Sellmyer, David J.},
abstractNote = {},
doi = {10.1063/1.5128659},
journal = {APL Materials},
number = 12,
volume = 7,
place = {United States},
year = {2019},
month = {12}
}
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DOI: https://doi.org/10.1063/1.5128659
DOI: https://doi.org/10.1063/1.5128659
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