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Title: High energy product of MnBi by field annealing and Sn alloying

Authors:
ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [1]; ORCiD logo [3]; ORCiD logo [3]; ORCiD logo [3]; ORCiD logo [1]; ORCiD logo [1]
  1. Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA, Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, USA
  2. Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA, Department of Physics, South Dakota State University, Brookings, South Dakota 57007, USA
  3. Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1580168
Grant/Contract Number:  
FG02-04ER46152
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
APL Materials
Additional Journal Information:
Journal Name: APL Materials Journal Volume: 7 Journal Issue: 12; Journal ID: ISSN 2166-532X
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, and Sellmyer, David J. High energy product of MnBi by field annealing and Sn alloying. United States: N. p., 2019. Web. doi:10.1063/1.5128659.
Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, & Sellmyer, David J. High energy product of MnBi by field annealing and Sn alloying. United States. doi:10.1063/1.5128659.
Zhang, Wenyong, Balasubramanian, Balamurugan, Kharel, Parashu, Pahari, Rabindra, Valloppilly, Shah R., Li, Xingzhong, Yue, Lanping, Skomski, Ralph, and Sellmyer, David J. Sun . "High energy product of MnBi by field annealing and Sn alloying". United States. doi:10.1063/1.5128659.
@article{osti_1580168,
title = {High energy product of MnBi by field annealing and Sn alloying},
author = {Zhang, Wenyong and Balasubramanian, Balamurugan and Kharel, Parashu and Pahari, Rabindra and Valloppilly, Shah R. and Li, Xingzhong and Yue, Lanping and Skomski, Ralph and Sellmyer, David J.},
abstractNote = {},
doi = {10.1063/1.5128659},
journal = {APL Materials},
number = 12,
volume = 7,
place = {United States},
year = {2019},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1063/1.5128659

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