High power conditioning and benchmarking of planar nitrogen-incorporated ultrananocrystalline diamond field emission electron source
Abstract
Planar nitrogen-incorporated ultrananocrystalline diamond [(N)UNCD] has emerged as a unique field emission source attractive for accelerator applications because of its capability to generate a high charge beam and handle moderate vacuum conditions. Most importantly, (N)UNCD sources are simple to produce: Conventional high aspect ratio isolated emitters are not required to be formed on the surface, and the actual emitter surface roughness is on the order of only 10–100 nm. A careful reliability assessment of (N)UNCD is required before it may find routine application in accelerator systems. In the present study using an L-band normal conducting single-cell rf gun, a (N)UNCD cathode has been conditioned to ~ 42 MV / m in a well-controlled manner. It reached a maximum output charge of 15 nC corresponding to an average current of 6 mA during an emission period of 2.5 $μ$s . Imaging of the emission current revealed a large number of isolated emitters (density over 100/cm2 ) distributed on the cathode, which is consistent with previous tests in dc environments. The performance metrics, the emission imaging, and the systematic study of emission properties during rf conditioning in a wide gradient range assert (N)UNCD as an enabling electron source for rf injector designsmore »
- Authors:
- Publication Date:
- Research Org.:
- Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
- Sponsoring Org.:
- USDOE Office of Science (SC), High Energy Physics (HEP); National Science Foundation (NSF)
- OSTI Identifier:
- 1579295
- Alternate Identifier(s):
- OSTI ID: 1616520
- Grant/Contract Number:
- AC02-06CH11357; SC0018362; SC0015479; NSF-1739150; NSF-1535676
- Resource Type:
- Published Article
- Journal Name:
- Physical Review Accelerators and Beams
- Additional Journal Information:
- Journal Name: Physical Review Accelerators and Beams Journal Volume: 22 Journal Issue: 12; Journal ID: ISSN 2469-9888
- Publisher:
- American Physical Society (APS)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Citation Formats
Shao, Jiahang, Schneider, Mitchell, Chen, Gongxiaohui, Nikhar, Tanvi, Kovi, Kiran Kumar, Spentzouris, Linda, Wisniewski, Eric, Power, John, Conde, Manoel, Liu, Wanming, and Baryshev, Sergey V. High power conditioning and benchmarking of planar nitrogen-incorporated ultrananocrystalline diamond field emission electron source. United States: N. p., 2019.
Web. doi:10.1103/PhysRevAccelBeams.22.123402.
Shao, Jiahang, Schneider, Mitchell, Chen, Gongxiaohui, Nikhar, Tanvi, Kovi, Kiran Kumar, Spentzouris, Linda, Wisniewski, Eric, Power, John, Conde, Manoel, Liu, Wanming, & Baryshev, Sergey V. High power conditioning and benchmarking of planar nitrogen-incorporated ultrananocrystalline diamond field emission electron source. United States. https://doi.org/10.1103/PhysRevAccelBeams.22.123402
Shao, Jiahang, Schneider, Mitchell, Chen, Gongxiaohui, Nikhar, Tanvi, Kovi, Kiran Kumar, Spentzouris, Linda, Wisniewski, Eric, Power, John, Conde, Manoel, Liu, Wanming, and Baryshev, Sergey V. Wed .
"High power conditioning and benchmarking of planar nitrogen-incorporated ultrananocrystalline diamond field emission electron source". United States. https://doi.org/10.1103/PhysRevAccelBeams.22.123402.
@article{osti_1579295,
title = {High power conditioning and benchmarking of planar nitrogen-incorporated ultrananocrystalline diamond field emission electron source},
author = {Shao, Jiahang and Schneider, Mitchell and Chen, Gongxiaohui and Nikhar, Tanvi and Kovi, Kiran Kumar and Spentzouris, Linda and Wisniewski, Eric and Power, John and Conde, Manoel and Liu, Wanming and Baryshev, Sergey V.},
abstractNote = {Planar nitrogen-incorporated ultrananocrystalline diamond [(N)UNCD] has emerged as a unique field emission source attractive for accelerator applications because of its capability to generate a high charge beam and handle moderate vacuum conditions. Most importantly, (N)UNCD sources are simple to produce: Conventional high aspect ratio isolated emitters are not required to be formed on the surface, and the actual emitter surface roughness is on the order of only 10–100 nm. A careful reliability assessment of (N)UNCD is required before it may find routine application in accelerator systems. In the present study using an L-band normal conducting single-cell rf gun, a (N)UNCD cathode has been conditioned to ~ 42 MV / m in a well-controlled manner. It reached a maximum output charge of 15 nC corresponding to an average current of 6 mA during an emission period of 2.5 $μ$s . Imaging of the emission current revealed a large number of isolated emitters (density over 100/cm2 ) distributed on the cathode, which is consistent with previous tests in dc environments. The performance metrics, the emission imaging, and the systematic study of emission properties during rf conditioning in a wide gradient range assert (N)UNCD as an enabling electron source for rf injector designs serving industrial and scientific applications. These studies also improve the fundamental knowledge of the practical conditioning procedure via a better understanding of the emission mechanisms.},
doi = {10.1103/PhysRevAccelBeams.22.123402},
journal = {Physical Review Accelerators and Beams},
number = 12,
volume = 22,
place = {United States},
year = {2019},
month = {12}
}
https://doi.org/10.1103/PhysRevAccelBeams.22.123402
Web of Science
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