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Title: Ferroelectric Domain Wall Motion in Freestanding Single‐Crystal Complex Oxide Thin Film

Authors:
ORCiD logo [1];  [2];  [2];  [3];  [3];  [3];  [4];  [4];  [1];  [1];  [3]
  1. Materials Science DivisionArgonne National Laboratory Lemont IL 60439 USA
  2. Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea
  3. Center for Nanoscale MaterialsArgonne National Laboratory Lemont IL 60439 USA
  4. Electrical Engineering &, Computer SciencesUniversity of California Berkeley CA 94720 USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1577878
Grant/Contract Number:  
DE‐AC02‐ 06CH11357
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Bakaul, Saidur R., Kim, Jaegyu, Hong, Seungbum, Cherukara, Mathew J., Zhou, Tao, Stan, Liliana, Serrao, Claudy R., Salahuddin, Sayeef, Petford‐Long, Amanda K., Fong, Dillon D., and Holt, Martin V. Ferroelectric Domain Wall Motion in Freestanding Single‐Crystal Complex Oxide Thin Film. Germany: N. p., 2019. Web. doi:10.1002/adma.201907036.
Bakaul, Saidur R., Kim, Jaegyu, Hong, Seungbum, Cherukara, Mathew J., Zhou, Tao, Stan, Liliana, Serrao, Claudy R., Salahuddin, Sayeef, Petford‐Long, Amanda K., Fong, Dillon D., & Holt, Martin V. Ferroelectric Domain Wall Motion in Freestanding Single‐Crystal Complex Oxide Thin Film. Germany. doi:10.1002/adma.201907036.
Bakaul, Saidur R., Kim, Jaegyu, Hong, Seungbum, Cherukara, Mathew J., Zhou, Tao, Stan, Liliana, Serrao, Claudy R., Salahuddin, Sayeef, Petford‐Long, Amanda K., Fong, Dillon D., and Holt, Martin V. Mon . "Ferroelectric Domain Wall Motion in Freestanding Single‐Crystal Complex Oxide Thin Film". Germany. doi:10.1002/adma.201907036.
@article{osti_1577878,
title = {Ferroelectric Domain Wall Motion in Freestanding Single‐Crystal Complex Oxide Thin Film},
author = {Bakaul, Saidur R. and Kim, Jaegyu and Hong, Seungbum and Cherukara, Mathew J. and Zhou, Tao and Stan, Liliana and Serrao, Claudy R. and Salahuddin, Sayeef and Petford‐Long, Amanda K. and Fong, Dillon D. and Holt, Martin V.},
abstractNote = {},
doi = {10.1002/adma.201907036},
journal = {Advanced Materials},
number = ,
volume = ,
place = {Germany},
year = {2019},
month = {12}
}

Journal Article:
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