skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

This content will become publicly available on November 21, 2020

Title: Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

Authors:
ORCiD logo [1];  [2];  [3];  [3];  [2]; ORCiD logo [4];  [3]
  1. Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, Department of Micro- and Nanoelectronic Systems, Ilmenau University of Technology, Ilmenau 98684, Germany
  2. Seagate Technology LLC, Fremont Research Center, Fremont, California 94538
  3. Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720
  4. Department of Micro- and Nanoelectronic Systems, Ilmenau University of Technology, Ilmenau 98684, Germany
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1575107
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Volume: 37 Journal Issue: 6; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Staaks, Daniel, Yu, Zhaoning, Dhuey, Scott D., Sassolini, Simone, Lee, Kim Y., Rangelow, Ivo W., and Olynick, Deirdre L. Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication. United States: N. p., 2019. Web. doi:10.1116/1.5123397.
Staaks, Daniel, Yu, Zhaoning, Dhuey, Scott D., Sassolini, Simone, Lee, Kim Y., Rangelow, Ivo W., & Olynick, Deirdre L. Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication. United States. doi:10.1116/1.5123397.
Staaks, Daniel, Yu, Zhaoning, Dhuey, Scott D., Sassolini, Simone, Lee, Kim Y., Rangelow, Ivo W., and Olynick, Deirdre L. Sun . "Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication". United States. doi:10.1116/1.5123397.
@article{osti_1575107,
title = {Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication},
author = {Staaks, Daniel and Yu, Zhaoning and Dhuey, Scott D. and Sassolini, Simone and Lee, Kim Y. and Rangelow, Ivo W. and Olynick, Deirdre L.},
abstractNote = {},
doi = {10.1116/1.5123397},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 6,
volume = 37,
place = {United States},
year = {2019},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on November 21, 2020
Publisher's Version of Record

Save / Share: