The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective
Abstract
Sequential infiltration synthesis (SIS) is an emerging materials growth method by which inorganic metal oxides are nucleated and grown within the free volume of polymers in association with chemical functional groups in the polymer. SIS enables the growth of novel polymer-inorganic hybrid materials, porous inorganic materials, and spatially templated nanoscale devices of relevance to a host of technological applications. Although SIS borrows from the precursors and equipment of atomic layer deposition (ALD), the chemistry and physics of SIS differ in important ways. These differences arise from the permeable three-dimensional distribution of functional groups in polymers in SIS, which contrast to the typically impermeable two-dimensional distribution of active sites on solid surfaces in ALD. In SIS, metal-organic vapor-phase precursors dissolve and diffuse into polymers and interact with these functional groups through reversible complex formation and/or irreversible chemical reactions. In this perspective, we describe the thermodynamics and kinetics of SIS and attempt to disentangle the tightly coupled physical and chemical processes that underlie this method. Here, we discuss the various experimental, computational, and theoretical efforts that provide insight into SIS mechanisms and identify approaches that may fill out current gaps in knowledge and expand the utilization of SIS.
- Authors:
-
[1];
[2];
[2];
[3];
[3];
[1]
- Univ. of Chicago, IL (United States); Argonne National Lab. (ANL), Lemont, IL (United States); Energy Frontier Research Center (EFRC), Lemont, IL (United States)
- Argonne National Lab. (ANL), Lemont, IL (United States)
- Energy Frontier Research Center (EFRC), Lemont, IL (United States); Argonne National Lab. (ANL), Lemont, IL (United States)
- Publication Date:
- Research Org.:
- Energy Frontier Research Centers (EFRC) (United States). Advanced Materials for Energy-Water Systems (AMEWS); Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
- OSTI Identifier:
- 1592570
- Alternate Identifier(s):
- OSTI ID: 1574546
- Grant/Contract Number:
- AC02-06CH11357
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Chemical Physics
- Additional Journal Information:
- Journal Volume: 151; Journal Issue: 19; Journal ID: ISSN 0021-9606
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Waldman, Ruben Z., Mandia, David J., Yanguas-Gil, Angel, Martinson, Alex B. F., Elam, Jeffrey W., and Darling, Seth B. The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective. United States: N. p., 2019.
Web. doi:10.1063/1.5128108.
Waldman, Ruben Z., Mandia, David J., Yanguas-Gil, Angel, Martinson, Alex B. F., Elam, Jeffrey W., & Darling, Seth B. The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective. United States. https://doi.org/10.1063/1.5128108
Waldman, Ruben Z., Mandia, David J., Yanguas-Gil, Angel, Martinson, Alex B. F., Elam, Jeffrey W., and Darling, Seth B. Tue .
"The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective". United States. https://doi.org/10.1063/1.5128108. https://www.osti.gov/servlets/purl/1592570.
@article{osti_1592570,
title = {The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective},
author = {Waldman, Ruben Z. and Mandia, David J. and Yanguas-Gil, Angel and Martinson, Alex B. F. and Elam, Jeffrey W. and Darling, Seth B.},
abstractNote = {Sequential infiltration synthesis (SIS) is an emerging materials growth method by which inorganic metal oxides are nucleated and grown within the free volume of polymers in association with chemical functional groups in the polymer. SIS enables the growth of novel polymer-inorganic hybrid materials, porous inorganic materials, and spatially templated nanoscale devices of relevance to a host of technological applications. Although SIS borrows from the precursors and equipment of atomic layer deposition (ALD), the chemistry and physics of SIS differ in important ways. These differences arise from the permeable three-dimensional distribution of functional groups in polymers in SIS, which contrast to the typically impermeable two-dimensional distribution of active sites on solid surfaces in ALD. In SIS, metal-organic vapor-phase precursors dissolve and diffuse into polymers and interact with these functional groups through reversible complex formation and/or irreversible chemical reactions. In this perspective, we describe the thermodynamics and kinetics of SIS and attempt to disentangle the tightly coupled physical and chemical processes that underlie this method. Here, we discuss the various experimental, computational, and theoretical efforts that provide insight into SIS mechanisms and identify approaches that may fill out current gaps in knowledge and expand the utilization of SIS.},
doi = {10.1063/1.5128108},
journal = {Journal of Chemical Physics},
number = 19,
volume = 151,
place = {United States},
year = {Tue Nov 19 00:00:00 EST 2019},
month = {Tue Nov 19 00:00:00 EST 2019}
}
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Works referencing / citing this record:
Resolving Triblock Terpolymer Morphologies by Vapor-Phase Infiltration
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