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Thermal conductance of aluminum oxy-fluoride passivation layers
Abstract
Here, the thermal properties of plasma-generated aluminum oxyfluoride passivation layers at the surface of aluminum thin films are measured. The oxyfluoride layers are generated using plasmas produced in mixtures of NH 3 and SF 6 to simultaneously remove oxygen and add fluorine to the aluminum surface, an alternative approach to the more conventional two-step methods that utilize HF treatments to remove the native oxide followed by metal-fluoride (e.g., MgF 2, LiF, and AlF 3) thin film deposition that serves to protect the aluminum surface from further oxidation. Here, the change in thermal properties of the layers as a function of plasma processing time is determined. A significant reduction in thermal boundary conductance is measured with the increasing treatment time, which can be related to the increasing fluorine content in the layers. Acoustic reflection measurements suggest this reduced thermal boundary conductance is related to lower bonding strength to aluminum with increasing fluorine.
- Authors:
-
[1];
[1]
- Univ. of Virginia, Charlottesville, VA (United States)
- Naval Research Lab. (NRL), Washington, DC (United States)
- Naval Research Lab. (NRL), Washington, DC (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Publication Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1574485
- Report Number(s):
- SAND-2019-13758J
Journal ID: ISSN 0003-6951; 681349
- Grant/Contract Number:
- AC04-94AL85000
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Volume: 115; Journal Issue: 19; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Tomko, John A., Boris, David R., Rosenberg, Samantha G., Walton, Scott G., and Hopkins, Patrick E. Thermal conductance of aluminum oxy-fluoride passivation layers. United States: N. p., 2019.
Web. doi:10.1063/1.5120028.
Tomko, John A., Boris, David R., Rosenberg, Samantha G., Walton, Scott G., & Hopkins, Patrick E. Thermal conductance of aluminum oxy-fluoride passivation layers. United States. doi:10.1063/1.5120028.
Tomko, John A., Boris, David R., Rosenberg, Samantha G., Walton, Scott G., and Hopkins, Patrick E. Mon .
"Thermal conductance of aluminum oxy-fluoride passivation layers". United States. doi:10.1063/1.5120028.
@article{osti_1574485,
title = {Thermal conductance of aluminum oxy-fluoride passivation layers},
author = {Tomko, John A. and Boris, David R. and Rosenberg, Samantha G. and Walton, Scott G. and Hopkins, Patrick E.},
abstractNote = {Here, the thermal properties of plasma-generated aluminum oxyfluoride passivation layers at the surface of aluminum thin films are measured. The oxyfluoride layers are generated using plasmas produced in mixtures of NH3 and SF6 to simultaneously remove oxygen and add fluorine to the aluminum surface, an alternative approach to the more conventional two-step methods that utilize HF treatments to remove the native oxide followed by metal-fluoride (e.g., MgF2, LiF, and AlF3) thin film deposition that serves to protect the aluminum surface from further oxidation. Here, the change in thermal properties of the layers as a function of plasma processing time is determined. A significant reduction in thermal boundary conductance is measured with the increasing treatment time, which can be related to the increasing fluorine content in the layers. Acoustic reflection measurements suggest this reduced thermal boundary conductance is related to lower bonding strength to aluminum with increasing fluorine.},
doi = {10.1063/1.5120028},
journal = {Applied Physics Letters},
number = 19,
volume = 115,
place = {United States},
year = {2019},
month = {11}
}
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DOI: 10.1063/1.5120028
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