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Title: Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor

Abstract

Polyamide thin films were rapidly grown using spatial molecular layer deposition (MLD) in a rotating cylinder reactor. The polyamide MLD films were coated on flexible metalized polyethylene terephthalate (PET) substrates using sequential exposures of trimesoyl chloride (TMC) and m-phenylenediamine (mPD). The rotating cylinder reactor was housed in a custom oven enclosure that maintained a constant temperature of 115°C. One MLD cycle (TMC/mPD) as performed per rotation of the cylinder. Polyamide growth rates of 4.5 Å/cycle or 90 Å/min were observed at a slow rotation speed of 20 revolutions per minute (RPM) at a substrate speed of 0.33 m/s. Growth rates of 2.27 Å/cycle or 477 Å/min were measured at higher rotation speeds of 210 RPM at substrate speeds of 3.5 m/s. The polyamide film thicknesses were uniform over the substrate widths as large as ~16.5 cm. The polyamide MLD surface chemistry was also self-limiting. Constant polyamide growth rate per cycle was measured at larger TMC and mPD exposures. In addition, infrared analysis and thermal annealing studies confirmed the chemical identity of the polyamide films. With four MLD cycles per rotation on the rotating cylinder, spatial MLD should be able to obtain polymer growth rates of >1900 Å/min at a rotationmore » speed 210 RPM. These rapid growth rates are much higher than the growth rates that can be obtained in temporal MLD reactors. Finally, the spatial MLD of polyamide films has many possible applications including the deposition of ultrathin reverse osmosis membranes for water desalination.« less

Authors:
 [1];  [1];  [1];  [2]
  1. Univ. of Colorado, Boulder, CO (United States). Dept. of Chemistry and Biochemistry
  2. Univ. of Colorado, Boulder, CO (United States). Dept. of Chemistry and Biochemistry, and Dept. of Mechanical Engineering
Publication Date:
Research Org.:
GE Global Research, Niskayuna, NY (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Advanced Manufacturing Office (EE-5A)
OSTI Identifier:
1574216
Alternate Identifier(s):
OSTI ID: 1414050
Grant/Contract Number:  
EE0005771
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 1; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Higgs, Daniel J., DuMont, Jaime W., Sharma, Kashish, and George, Steven M. Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor. United States: N. p., 2017. Web. doi:10.1116/1.5004041.
Higgs, Daniel J., DuMont, Jaime W., Sharma, Kashish, & George, Steven M. Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor. United States. doi:10.1116/1.5004041.
Higgs, Daniel J., DuMont, Jaime W., Sharma, Kashish, and George, Steven M. Tue . "Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor". United States. doi:10.1116/1.5004041. https://www.osti.gov/servlets/purl/1574216.
@article{osti_1574216,
title = {Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor},
author = {Higgs, Daniel J. and DuMont, Jaime W. and Sharma, Kashish and George, Steven M.},
abstractNote = {Polyamide thin films were rapidly grown using spatial molecular layer deposition (MLD) in a rotating cylinder reactor. The polyamide MLD films were coated on flexible metalized polyethylene terephthalate (PET) substrates using sequential exposures of trimesoyl chloride (TMC) and m-phenylenediamine (mPD). The rotating cylinder reactor was housed in a custom oven enclosure that maintained a constant temperature of 115°C. One MLD cycle (TMC/mPD) as performed per rotation of the cylinder. Polyamide growth rates of 4.5 Å/cycle or 90 Å/min were observed at a slow rotation speed of 20 revolutions per minute (RPM) at a substrate speed of 0.33 m/s. Growth rates of 2.27 Å/cycle or 477 Å/min were measured at higher rotation speeds of 210 RPM at substrate speeds of 3.5 m/s. The polyamide film thicknesses were uniform over the substrate widths as large as ~16.5 cm. The polyamide MLD surface chemistry was also self-limiting. Constant polyamide growth rate per cycle was measured at larger TMC and mPD exposures. In addition, infrared analysis and thermal annealing studies confirmed the chemical identity of the polyamide films. With four MLD cycles per rotation on the rotating cylinder, spatial MLD should be able to obtain polymer growth rates of >1900 Å/min at a rotation speed 210 RPM. These rapid growth rates are much higher than the growth rates that can be obtained in temporal MLD reactors. Finally, the spatial MLD of polyamide films has many possible applications including the deposition of ultrathin reverse osmosis membranes for water desalination.},
doi = {10.1116/1.5004041},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 1,
volume = 36,
place = {United States},
year = {2017},
month = {12}
}

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