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Title: High- κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics

Abstract

For the first time, sulfonylated polymers of intrinsic microporosity (PIMs) are exploited for high- κ , high-temperature, and low-loss gate dielectric applications.

Authors:
ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [3];  [1];  [1]; ORCiD logo [4]; ORCiD logo [2];  [1]; ORCiD logo [3]; ORCiD logo [1]
  1. Department of Macromolecular Science and Engineering, Case Western Reserve University, USA
  2. Key Laboratory of Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, P. R. China
  3. Department of Physics, Case Western Reserve University, Cleveland, USA
  4. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1574039
Grant/Contract Number:  
SC0012704
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Materials Horizons
Additional Journal Information:
Journal Name: Materials Horizons; Journal ID: ISSN 2051-6347
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Zhang, Zhongbo, Zheng, Jifu, Premasiri, Kasun, Kwok, Man-Hin, Li, Qiong, Li, Ruipeng, Zhang, Suobo, Litt, Morton H., Gao, Xuan P. A., and Zhu, Lei. High- κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics. United Kingdom: N. p., 2020. Web. doi:10.1039/C9MH01261C.
Zhang, Zhongbo, Zheng, Jifu, Premasiri, Kasun, Kwok, Man-Hin, Li, Qiong, Li, Ruipeng, Zhang, Suobo, Litt, Morton H., Gao, Xuan P. A., & Zhu, Lei. High- κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics. United Kingdom. doi:10.1039/C9MH01261C.
Zhang, Zhongbo, Zheng, Jifu, Premasiri, Kasun, Kwok, Man-Hin, Li, Qiong, Li, Ruipeng, Zhang, Suobo, Litt, Morton H., Gao, Xuan P. A., and Zhu, Lei. Wed . "High- κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics". United Kingdom. doi:10.1039/C9MH01261C.
@article{osti_1574039,
title = {High- κ polymers of intrinsic microporosity: a new class of high temperature and low loss dielectrics for printed electronics},
author = {Zhang, Zhongbo and Zheng, Jifu and Premasiri, Kasun and Kwok, Man-Hin and Li, Qiong and Li, Ruipeng and Zhang, Suobo and Litt, Morton H. and Gao, Xuan P. A. and Zhu, Lei},
abstractNote = {For the first time, sulfonylated polymers of intrinsic microporosity (PIMs) are exploited for high- κ , high-temperature, and low-loss gate dielectric applications.},
doi = {10.1039/C9MH01261C},
journal = {Materials Horizons},
number = ,
volume = ,
place = {United Kingdom},
year = {2020},
month = {1}
}

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