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Title: Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm

Authors:
ORCiD logo [1];  [1];  [1]; ORCiD logo [2]; ORCiD logo [1]
+ Show Author Affiliations
  1. Department of Chemistry, University of California, Berkeley, California 94720, USA and Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  2. Department of Chemical Engineering, University of Melbourne, Victoria 3010 Australia
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1573085
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Chemical Physics
Additional Journal Information:
Journal Name: Journal of Chemical Physics Journal Volume: 151 Journal Issue: 17; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, and Neumark, Daniel M. Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm. United States: N. p., 2019. Web. doi:10.1063/1.5121294.
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Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, & Neumark, Daniel M. Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm. United States. doi:10.1063/1.5121294.
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Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, and Neumark, Daniel M. Thu . "Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm". United States. doi:10.1063/1.5121294.
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@article{osti_1573085,
title = {Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm},
author = {Sullivan, Erin N. and Nichols, Bethan and von Kugelgen, Stephen and da Silva, Gabriel and Neumark, Daniel M.},
abstractNote = {},
doi = {10.1063/1.5121294},
journal = {Journal of Chemical Physics},
number = 17,
volume = 151,
place = {United States},
year = {2019},
month = {11}
}
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Journal Article:
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DOI: 10.1063/1.5121294
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