This content will become publicly available on November 4, 2020
Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm
- Authors:
-
[1];
[2];
[1]
- Department of Chemistry, University of California, Berkeley, California 94720, USA and Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
- Department of Chemical Engineering, University of Melbourne, Victoria 3010 Australia
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1573085
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Journal of Chemical Physics
- Additional Journal Information:
- Journal Name: Journal of Chemical Physics Journal Volume: 151 Journal Issue: 17; Journal ID: ISSN 0021-9606
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, and Neumark, Daniel M. Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm. United States: N. p., 2019.
Web. doi:10.1063/1.5121294.
Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, & Neumark, Daniel M. Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm. United States. doi:10.1063/1.5121294.
Sullivan, Erin N., Nichols, Bethan, von Kugelgen, Stephen, da Silva, Gabriel, and Neumark, Daniel M. Thu .
"Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm". United States. doi:10.1063/1.5121294.
@article{osti_1573085,
title = {Multiphoton dissociation dynamics of the indenyl radical at 248 nm and 193 nm},
author = {Sullivan, Erin N. and Nichols, Bethan and von Kugelgen, Stephen and da Silva, Gabriel and Neumark, Daniel M.},
abstractNote = {},
doi = {10.1063/1.5121294},
journal = {Journal of Chemical Physics},
number = 17,
volume = 151,
place = {United States},
year = {2019},
month = {11}
}
Free Publicly Available Full Text
This content will become publicly available on November 4, 2020
Publisher's Version of Record
DOI: 10.1063/1.5121294
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