Next generation of extreme-resolution electron beam lithography

Randall, John N.; Owen, James H. G.; Lake, Joseph; Fuchs, Ehud

doi:10.1116/1.5119392

Title: Next generation of extreme-resolution electron beam lithography

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Authors:

^[1]; Owen, James H. G. ^[1]; Lake, Joseph ^[1]; Fuchs, Ehud ^[1]

Zyvex Labs, 1301 North Plano Road, Richardson, Texas 75081

Publication Date:: 2019-11-01

Sponsoring Org.:: USDOE

OSTI Identifier:: 1571838

Grant/Contract Number:: EE0008322

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology B

Additional Journal Information:: Journal Name: Journal of Vacuum Science and Technology B Journal Volume: 37 Journal Issue: 6; Journal ID: ISSN 2166-2746

Publisher:: American Vacuum Society

Country of Publication:: United States

Language:: English

Citation Formats


                    Randall, John N., Owen, James H. G., Lake, Joseph, and Fuchs, Ehud. Next generation of extreme-resolution electron beam lithography.  United States: N. p., 2019. 
        Web.  doi:10.1116/1.5119392.

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                    Randall, John N., Owen, James H. G., Lake, Joseph, & Fuchs, Ehud. Next generation of extreme-resolution electron beam lithography.  United States.  doi:https://doi.org/10.1116/1.5119392

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                    Randall, John N., Owen, James H. G., Lake, Joseph, and Fuchs, Ehud. Fri .  
        "Next generation of extreme-resolution electron beam lithography".  United States.  doi:https://doi.org/10.1116/1.5119392.

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@article{osti_1571838,

  title        = {Next generation of extreme-resolution electron beam lithography},

  author       = {Randall, John N. and Owen, James H. G. and Lake, Joseph and Fuchs, Ehud},

  abstractNote = {},

  doi          = {10.1116/1.5119392},

  journal      = {Journal of Vacuum Science and Technology B},

  number       = 6,

  volume       = 37,

  place        = {United States},

  year         = {2019},

  month        = {11}

}

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DOI: https://doi.org/10.1116/1.5119392

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