skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

This content will become publicly available on October 25, 2020

Title: Next generation of extreme-resolution electron beam lithography

Authors:
ORCiD logo [1];  [1];  [1];  [1]
  1. Zyvex Labs, 1301 North Plano Road, Richardson, Texas 75081
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1571838
Grant/Contract Number:  
EE0008322
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
Additional Journal Information:
Journal Name: Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics Journal Volume: 37 Journal Issue: 6; Journal ID: ISSN 2166-2746
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English

Citation Formats

Randall, John N., Owen, James H. G., Lake, Joseph, and Fuchs, Ehud. Next generation of extreme-resolution electron beam lithography. United States: N. p., 2019. Web. doi:10.1116/1.5119392.
Randall, John N., Owen, James H. G., Lake, Joseph, & Fuchs, Ehud. Next generation of extreme-resolution electron beam lithography. United States. doi:10.1116/1.5119392.
Randall, John N., Owen, James H. G., Lake, Joseph, and Fuchs, Ehud. Fri . "Next generation of extreme-resolution electron beam lithography". United States. doi:10.1116/1.5119392.
@article{osti_1571838,
title = {Next generation of extreme-resolution electron beam lithography},
author = {Randall, John N. and Owen, James H. G. and Lake, Joseph and Fuchs, Ehud},
abstractNote = {},
doi = {10.1116/1.5119392},
journal = {Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics},
number = 6,
volume = 37,
place = {United States},
year = {2019},
month = {11}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on October 25, 2020
Publisher's Version of Record

Save / Share: