This content will become publicly available on October 22, 2020
Comparative study of topological Hall effect and skyrmions in NiMnIn and NiMnGa
- Authors:
-
[1];
[1];
[2];
- Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA, Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, USA
- Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588, USA
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1571348
- Grant/Contract Number:
- FG02-04ER46152
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 115 Journal Issue: 17; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Zhang, Wenyong, Balasubramanian, Balamurugan, Ullah, Ahsan, Pahari, Rabindra, Li, Xingzhong, Yue, Lanping, Valloppilly, Shah R., Sokolov, Andrei, Skomski, Ralph, and Sellmyer, David J. Comparative study of topological Hall effect and skyrmions in NiMnIn and NiMnGa. United States: N. p., 2019.
Web. doi:10.1063/1.5120406.
Zhang, Wenyong, Balasubramanian, Balamurugan, Ullah, Ahsan, Pahari, Rabindra, Li, Xingzhong, Yue, Lanping, Valloppilly, Shah R., Sokolov, Andrei, Skomski, Ralph, & Sellmyer, David J. Comparative study of topological Hall effect and skyrmions in NiMnIn and NiMnGa. United States. doi:10.1063/1.5120406.
Zhang, Wenyong, Balasubramanian, Balamurugan, Ullah, Ahsan, Pahari, Rabindra, Li, Xingzhong, Yue, Lanping, Valloppilly, Shah R., Sokolov, Andrei, Skomski, Ralph, and Sellmyer, David J. Mon .
"Comparative study of topological Hall effect and skyrmions in NiMnIn and NiMnGa". United States. doi:10.1063/1.5120406.
@article{osti_1571348,
title = {Comparative study of topological Hall effect and skyrmions in NiMnIn and NiMnGa},
author = {Zhang, Wenyong and Balasubramanian, Balamurugan and Ullah, Ahsan and Pahari, Rabindra and Li, Xingzhong and Yue, Lanping and Valloppilly, Shah R. and Sokolov, Andrei and Skomski, Ralph and Sellmyer, David J.},
abstractNote = {},
doi = {10.1063/1.5120406},
journal = {Applied Physics Letters},
number = 17,
volume = 115,
place = {United States},
year = {2019},
month = {10}
}
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DOI: 10.1063/1.5120406
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