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Title: Thickness and defocus dependence of inter-atomic electric fields measured by scanning diffraction

Authors:
; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1570523
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Ultramicroscopy
Additional Journal Information:
Journal Name: Ultramicroscopy Journal Volume: 208 Journal Issue: C; Journal ID: ISSN 0304-3991
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Addiego, Christopher, Gao, Wenpei, and Pan, Xiaoqing. Thickness and defocus dependence of inter-atomic electric fields measured by scanning diffraction. Netherlands: N. p., 2020. Web. doi:10.1016/j.ultramic.2019.112850.
Addiego, Christopher, Gao, Wenpei, & Pan, Xiaoqing. Thickness and defocus dependence of inter-atomic electric fields measured by scanning diffraction. Netherlands. https://doi.org/10.1016/j.ultramic.2019.112850
Addiego, Christopher, Gao, Wenpei, and Pan, Xiaoqing. Wed . "Thickness and defocus dependence of inter-atomic electric fields measured by scanning diffraction". Netherlands. https://doi.org/10.1016/j.ultramic.2019.112850.
@article{osti_1570523,
title = {Thickness and defocus dependence of inter-atomic electric fields measured by scanning diffraction},
author = {Addiego, Christopher and Gao, Wenpei and Pan, Xiaoqing},
abstractNote = {},
doi = {10.1016/j.ultramic.2019.112850},
journal = {Ultramicroscopy},
number = C,
volume = 208,
place = {Netherlands},
year = {2020},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.ultramic.2019.112850

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Cited by: 14 works
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