Metasurface-generated complex 3-dimensional optical fields for interference lithography
Abstract
Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask–assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.
- Authors:
-
[2];
- T. J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125,, Kavli Nanoscience Institute, California Institute of Technology, Pasadena, CA 91125,, Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720,, Department of Bioengineering, University of California, Berkeley, CA 94720
- T. J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125,, Kavli Nanoscience Institute, California Institute of Technology, Pasadena, CA 91125,
- Publication Date:
- Research Org.:
- California Institute of Technology (CalTech), Pasadena, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1569768
- Alternate Identifier(s):
- OSTI ID: 1625044
- Grant/Contract Number:
- SC0001293
- Resource Type:
- Published Article
- Journal Name:
- Proceedings of the National Academy of Sciences of the United States of America
- Additional Journal Information:
- Journal Name: Proceedings of the National Academy of Sciences of the United States of America Journal Volume: 116 Journal Issue: 43; Journal ID: ISSN 0027-8424
- Publisher:
- Proceedings of the National Academy of Sciences
- Country of Publication:
- United States
- Language:
- English
- Subject:
- Science & Technology - Other Topics
Citation Formats
Kamali, Seyedeh Mahsa, Arbabi, Ehsan, Kwon, Hyounghan, and Faraon, Andrei. Metasurface-generated complex 3-dimensional optical fields for interference lithography. United States: N. p., 2019.
Web. doi:10.1073/pnas.1908382116.
Kamali, Seyedeh Mahsa, Arbabi, Ehsan, Kwon, Hyounghan, & Faraon, Andrei. Metasurface-generated complex 3-dimensional optical fields for interference lithography. United States. https://doi.org/10.1073/pnas.1908382116
Kamali, Seyedeh Mahsa, Arbabi, Ehsan, Kwon, Hyounghan, and Faraon, Andrei. Mon .
"Metasurface-generated complex 3-dimensional optical fields for interference lithography". United States. https://doi.org/10.1073/pnas.1908382116.
@article{osti_1569768,
title = {Metasurface-generated complex 3-dimensional optical fields for interference lithography},
author = {Kamali, Seyedeh Mahsa and Arbabi, Ehsan and Kwon, Hyounghan and Faraon, Andrei},
abstractNote = {Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask–assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.},
doi = {10.1073/pnas.1908382116},
journal = {Proceedings of the National Academy of Sciences of the United States of America},
number = 43,
volume = 116,
place = {United States},
year = {2019},
month = {10}
}
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https://doi.org/10.1073/pnas.1908382116
https://doi.org/10.1073/pnas.1908382116
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Cited by: 2 works
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Figures / Tables:
Fig. 1: Concept of large-scale metamask-assisted 3D fabrication. Shown is a schematic illustration of large-scale metasurface-assisted 3D printing. A large metamask (∼1 cm2) is designed and used as a photolithography mask to create the desired 3D pattern in the photoresist. The large (∼1 cm2 wide and ∼10 µm thick) 3Dmore »
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